scholarly journals An Ultra-High-Q Lithium Niobate Microresonator Integrated with a Silicon Nitride Waveguide in the Vertical Configuration for Evanescent Light Coupling

Micromachines ◽  
2021 ◽  
Vol 12 (3) ◽  
pp. 235
Author(s):  
Jianhao Zhang ◽  
Rongbo Wu ◽  
Min Wang ◽  
Youting Liang ◽  
Junxia Zhou ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Lithium Niobate ◽  
Focused Ion Beam ◽  
Ring Resonator ◽  
Ion Beam ◽  
Fused Silica ◽  
Microring Resonator ◽  
Cladding Layer ◽  
Light Coupling ◽  
Integrated Device

We demonstrate the hybrid integration of a lithium niobate microring resonator with a silicon nitride waveguide in the vertical configuration to achieve efficient light coupling. The microring resonator is fabricated on a lithium niobate on insulator (LNOI) substrate using photolithography assisted chemo-mechanical etching (PLACE). A fused silica cladding layer is deposited on the LNOI ring resonator. The silicon nitride waveguide is further produced on the fused silica cladding layer by first fabricating a trench in the fused silica while using focused ion beam (FIB) etching for facilitating the evanescent coupling, followed by the formation of the silicon nitride waveguide on the bottom of the trench. The FIB etching ensures the required high positioning accuracy between the waveguide and ring resonator. We achieve Q-factors as high as 1.4 × 107 with the vertically integrated device.

scholarly journals An Ultra-high-Q lithium Niobate Microresonator Integrated with a Silicon Nitride Waveguide in the Vertical Configuration for Evanescent Light Coupling

2020 ◽  
Author(s):  
Jianhao Zhang ◽  
Rongbo Wu ◽  
Min Wang ◽  
Youting Liang ◽  
Junxia Zhou ◽  
...  
Keyword(s):  
Silicon Nitride ◽  
Lithium Niobate ◽  
Focused Ion Beam ◽  
Ring Resonator ◽  
Ion Beam ◽  
Fused Silica ◽  
Microring Resonator ◽  
Cladding Layer ◽  
Light Coupling ◽  
Integrated Device

We demonstrate hybrid integration of a lithium niobate microring resonator with a silicon nitride waveguide in the vertical configuration to achieve efficient light coupling. The microring resonator is fabricated on a lithium niobate on insulator (LNOI) substrate using photolithography assisted chemo-mechanical etching (PLACE). A fused silica cladding layer is deposited on the LNOI ring resonator. The silicon nitride waveguide is further produced on the fused silica cladding layer by first fabricating a trench in the fused silica using focused ion beam (FIB) etching for facilitating the evanescent coupling, followed by formation of the silicon nitride waveguide on the bottom of the trench. The FIB etching ensures the required high positioning accuracy between the waveguide and the ring resonator. We achieve Q-factors as high as 1.4*10^7 with the vertically integrated device.

Growth of isolated domains induced by focused ion beam irradiation in congruent lithium niobate

2017 ◽  
Vol 508 (1) ◽  
pp. 16-25 ◽  
Author(s):  
D. S. Chezganov ◽  
E. O. Vlasov ◽  
L.V. Gimadeeva ◽  
D. O. Alikin ◽  
M. A. Chuvakova ◽  
...  
Keyword(s):  
Lithium Niobate ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Beam Irradiation ◽  
Ion Beam Irradiation ◽  
Congruent Lithium Niobate

Fabrication of Sub-250nm High Aspect Ratio Apertures by Focused Ion Beam Lithography

2006 ◽  
Vol 983 ◽  
Author(s):  
Todd Simpson ◽  
Ian V Mitchell
Keyword(s):  
Silicon Nitride ◽  
High Resolution ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Gold Films ◽  
Ion Beam Lithography ◽  
Diameter Hole ◽  
Sem Imaging ◽  
Aperture Arrays

AbstractAperture arrays were fabricated in 1.0µm thick gold films supported on 20nm thick silicon nitride membranes. Lithographic milling strategies in gold were evaluated through the use of in-situ sectioning and high resolution SEM imaging with the UWO CrossBeam FIB/SEM. A successful strategy for producing a 250nm diameter hole with sidewalls approaching vertical is summarized.

In Vivo Biostability of CVD Silicon Oxide and Silicon Nitride Films

2005 ◽  
Vol 872 ◽  
Author(s):  
John M. Maloney ◽  
Sara A. Lipka ◽  
Samuel P. Baldwin
Keyword(s):  
Chemical Vapor Deposition ◽  
Silicon Nitride ◽  
Vapor Deposition ◽  
Focused Ion Beam ◽  
Silicon Oxide ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Silicon Chips ◽  
Silicon Nitride Films

AbstractLow pressure chemical vapor deposition (LPCVD) and plasma enhanced chemical vapor deposition (PECVD) silicon oxide and silicon nitride films were implanted subcutaneously in a rat model to study in vivo behavior of the films. Silicon chips coated with the films of interest were implanted for up to one year, and film thickness was evaluated by spectrophotometry and sectioning. Dissolution rates were estimated to be 0.33 nm/day for LPCVD silicon nitride, 2.0 nm/day for PECVD silicon nitride, and 3.5 nm/day for PECVD silicon oxide. A similar PECVD silicon oxide dissolution rate was observed on a silicon oxide / silicon nitride / silicon oxide stack that was sectioned by focused ion beam etching. These results provide a biostability reference for designing implantable microfabricated devices that feature exposed ceramic films.

Fabricating Nanofluidic Channels and Applying them for DNA Molecules Study

2007 ◽  
Vol 121-123 ◽  
pp. 777-780
Author(s):  
Kai Ge Wang ◽  
Peng Ye Wang ◽  
Shuang Lin Yue ◽  
Ai Zi Jin ◽  
Chang Zhi Gu ◽  
...  
Keyword(s):  
Aqueous Solution ◽  
Silicon Nitride ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Nanometer Scale ◽  
Dna Dynamics ◽  
Dna Molecules ◽  
Nanofluidic Channels ◽  
Silicon Nitride Membrane ◽  
Beam Instrument

In the emerging field of nanobiotechnology, further downsizing the fluidic channels and pores to the nanometer scale are attractive for both fundamental studies and technical applications. The insulation Silicon nitride membrane nanofluidic channel arrays which have width ~50nm and depth ~80nm and length ≥20μm were created by focused-ion-beam instrument. The λ-DNA molecules were put inside nanochannels and transferred, a fluorescence microscopy was used to observe the images. Only by capillary force, λ-DNA molecules moved inside the nanochannels which dealt with activating reagent Brij aqueous solution. These scope nanostructure devices will help us study DNA transporting through a nanopore and understand more DNA dynamics characteristics.

Fabrication of conical micropore structure on silicon nitride/silicon using focused ion beam milling for biosensor application

2015 ◽  
Vol 133 ◽  
pp. 1-5 ◽  
Author(s):  
Nur Hamizah Zainal Ariffin ◽  
Hafizal Yahaya ◽  
Shunji Shinano ◽  
Satoru Tanaka ◽  
Abdul Manaf Hashim
Keyword(s):  
Silicon Nitride ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Micropore Structure ◽  
Biosensor Application ◽  
Focused Ion Beam Milling

The effect of probe-tip geometry on force microscopy images

1993 ◽  
Vol 51 ◽  
pp. 520-521
Author(s):  
J. T. Thornton ◽  
E. M. T. Velu ◽  
C. B. Mooney ◽  
P. E. Russell
Keyword(s):  
Silicon Nitride ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Image Resolution ◽  
Growth Time ◽  
Hard Disks ◽  
Magnetic Recording Media ◽  
Force Microscopy ◽  
Atomic Force ◽  
Imaging Parameter

The atomic force microscope (AFM) has been used to characterize a variety of surfaces to study the influence of the instrumental parameters and sample topography on the interpretation of the images and the data obtained. The effect of the tip shape on the resulting image resolution and artifacts has been studied. Test samples of varied topography have been used to establish imaging parameter optimization for specific sample topographies.Chromium thin films of different thickness, deposited uniformly by rf diode sputtering, have been selected as test samples and imaged with a variety of tip shapes. These films were developed as underlayer films for magnetic recording media used in computer hard disks. The range of tips include commercial silicon nitride pyramidal tips, focused ion beam (FIB) sharpened silicon nitride pyramidal tips, and electron beam contamination induced tips (microtips) varying in growth time (i.e. length) from 10 to 40 seconds (approximately 0.40 to 0.65 μm).

scholarly journals Focused ion beam milling of microchannels in lithium niobate

2012 ◽  
Vol 6 (1) ◽  
pp. 012819 ◽  
Author(s):  
Manoj Sridhar ◽  
Devendra K. Maurya ◽  
James R. Friend ◽  
Leslie Y. Yeo
Keyword(s):  
Lithium Niobate ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Focused Ion Beam Milling

FIB-Based Fatigue Testing of Silicon Nitride Thin Films for Space Applications

2004 ◽  
Vol 851 ◽  
Author(s):  
Wen-Hsien Chuang ◽  
Rainer K. Fettig ◽  
Reza Ghodssi
Keyword(s):  
Thin Films ◽  
Silicon Nitride ◽  
Focused Ion Beam ◽  
Fatigue Testing ◽  
Ion Beam ◽  
Fatigue Properties ◽  
Test Duration ◽  
Electrostatic Actuator ◽  
Space Applications ◽  
James Webb Space Telescope

ABSTRACTA novel micro-scale electrostatic actuator has been designed and fabricated to study fatigue properties of low-stress LPCVD silicon nitride thin films, which are the structural materials of microshutter arrays to be used in NASA's James Webb Space Telescope (JWST). To obtain different stress levels without high applied voltages, the electrostatic actuator was designed based on a resonant technique to achieve mechanical amplification. All fabricated devices were tested inside a focused-ion-beam (FIB) system with pressure of 10-6 torr at room temperature (23 ± 1 °C) and with the test duration ranging from 5 seconds to 8.5 hours, 105 to 109 cycles, respectively. From the experiment, no fatigue failure of low-stress LPCVD silicon nitride thin films has been observed up to 109 testing cycles, four orders of magnitude higher than the expected lifetime of the microshutter arrays. The presented test device and experimental technique can be extended to characterize fatigue properties for other thin film materials.

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