scholarly journals The Heating Efficiency and Imaging Performance of Magnesium Iron Oxide@tetramethyl Ammonium Hydroxide Nanoparticles for Biomedical Applications

Nanomaterials ◽  
2021 ◽  
Vol 11 (5) ◽  
pp. 1096
Author(s):  
Mohamed S. A. Darwish ◽  
Hohyeon Kim ◽  
Minh Phu Bui ◽  
Tuan-Anh Le ◽  
Hwangjae Lee ◽  
...  

Multifunctional magnetic nanomaterials displaying high specific loss power (SLP) and high imaging sensitivity with good spatial resolution are highly desired in image-guided cancer therapy. Currently, commercial nanoparticles do not sufficiently provide such multifunctionality. For example, Resovist® has good image resolution but with a low SLP, whereas BNF® has a high SLP value with very low image resolution. In this study, hydrophilic magnesium iron oxide@tetramethyl ammonium hydroxide nanoparticles were prepared in two steps. First, hydrophobic magnesium iron oxide nanoparticles were fabricated using a thermal decomposition technique, followed by coating with tetramethyl ammonium hydroxide. The synthesized nanoparticles were characterized using XRD, DLS, TEM, zeta potential, UV-Vis spectroscopy, and VSM. The hyperthermia and imaging properties of the prepared nanoparticles were investigated and compared to the commercial nanoparticles. One-dimensional magnetic particle imaging indicated the good imaging resolution of our nanoparticles. Under the application of a magnetic field of frequency 614.4 kHz and strength 9.5 kA/m, nanoparticles generated heat with an SLP of 216.18 W/g, which is much higher than that of BNF (14 W/g). Thus, the prepared nanoparticles show promise as a novel dual-functional magnetic nanomaterial, enabling both high performance for hyperthermia and imaging functionality for diagnostic and therapeutic processes.

2019 ◽  
Vol 273 ◽  
pp. 71-76 ◽  
Author(s):  
Daniélen dos Santos Silva ◽  
Carine Souza dos Santos ◽  
Luzia Aparecida Pando ◽  
Mário Sérgio Rocha Gomes ◽  
Cleber Galvão Novaes ◽  
...  

2012 ◽  
Vol 30 (7) ◽  
pp. 724-734 ◽  
Author(s):  
Syouhei Nishihama ◽  
Miuki Murakami ◽  
Naoko Y. Igarashi ◽  
Katsutoshi Yamamoto ◽  
Kazuharu Yoshizuka

1996 ◽  
Vol 74 (S1) ◽  
pp. 79-84 ◽  
Author(s):  
S. Naseh ◽  
L. M. Landsberger ◽  
M. Kahrizi ◽  
M. Paranjape

Anisotropic etching of silicon in tetramethyl ammonium hydroxide (TMAH) is receiving attention as a relatively nontoxic alternative anisotropic etchant for silicon (Si), for the fabrication of microelectromechanical systems, sensors, and actuators. This work presents experimental investigations on several aspects of anisotropic etching of Si in TMAH. The effects of temperature and concentration on etch rates of {100} and {110} wafers are characterized. Several previously unreported experimental findings aimed at better understanding the atomic level mechanisms are presented: underetch-rate variation with mask-edge deviation, an investigation of stirring, and a subtle effect of applied bending stress.


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