scholarly journals Development of a Multialkali Photocathode Dc Gun for a Smith-Purcell Terahertz Free-Electron Laser

Particles ◽  
2018 ◽  
Vol 1 (1) ◽  
pp. 12 ◽  
Author(s):  
Nobuyuki Nishimori ◽  
Ryoji Nagai ◽  
Masaru Sawamura ◽  
Ryoichi Hajima
Keyword(s):  
High Voltage ◽  
Power Supply ◽  
Free Electron ◽  
Free Electron Laser ◽  
Vacuum Chamber ◽  
Wavelength Region ◽  
Beam Power ◽  
High Voltage Power Supply ◽  
Beam Dump ◽  
532 Nm

We have developed a photocathode dc gun for a compact Smith-Purcell free-electron laser in the terahertz wavelength region. The gun system consists of an alkali antimonide photocathode preparation chamber, a dc gun with a 250 kV-50 mA Cockcroft-Walton high-voltage power supply, and a downstream beamline with a water-cooled beam dump to accommodate a beam power of 5 kW. We fabricated a Cs3Sb photocathode with quantum efficiency of 5.8% at a wavelength of 532 nm and generated a 150 keV beam with current of up to 4.3 mA with a 500 mW laser. A vacuum chamber for the Smith-Purcell free-electron laser has been installed in the downstream beamline. We describe the present status of our work.

New replica method with plasma polymerized film by glow discharge

1988 ◽  
Vol 46 ◽  
pp. 414-415
Author(s):  
A. Tanaka ◽  
M. Yamaguchi ◽  
T. Hirano
Keyword(s):  
Power Supply ◽  
Plasma Polymerization ◽  
Vacuum Chamber ◽  
Complex Surface ◽  
Replica Method ◽  
Metal Extraction ◽  
High Voltage Power Supply ◽  
Negative Glow ◽  
Hydrocarbon Gas ◽  
Hydrocarbon Molecules

The plasma polymerization replica method and its apparatus have been devised by Tanaka (1-3). We have published several reports on its application: surface replicas of biological and inorganic specimens, replicas of freeze-fractured tissues and metal-extraction replicas with immunocytochemical markers.The apparatus for plasma polymerization consists of a high voltage power supply, a vacuum chamber containing a hydrocarbon gas (naphthalene, methane, ethylene), and electrodes of an anode disk and a cathode of the specimen base. The surface replication by plasma polymerization in negative glow phase on the cathode was carried out by gassing at 0.05-0.1 Torr and glow discharging at 1.5-3 kV D.C. Ionized hydrocarbon molecules diffused into complex surface configurations and deposited as a three-dimensionally polymerized film of 1050 nm in thickness.The resulting film on the complex surface had uniform thickness and showed no granular texture. Since the film was chemically inert, resistant to heat and mecanically strong, it could be treated with almost any organic or inorganic solvents.

scholarly journals High Power Impulse Magnetron Sputtering of In2O3/Sn Cold Sprayed Composite Target

Materials ◽  
2021 ◽  
Vol 14 (5) ◽  
pp. 1228
Author(s):  
Marcin Winnicki ◽  
Artur Wiatrowski ◽  
Michał Mazur
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
High Voltage ◽  
High Power ◽  
Power Supply ◽  
Indium Tin Oxide ◽  
Volume Ratio ◽  
Cold Spraying ◽  
High Voltage Power Supply ◽  
Composite Target

High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.

Development of the Full-Digital High Voltage Power Supply for Electronic Beam Welder

2011 ◽  
Vol 383-390 ◽  
pp. 4306-4311
Author(s):  
Sheng Wen Fan ◽  
Ze Ting Wang
Keyword(s):  
High Voltage ◽  
Power Supply ◽  
Rapid Recovery ◽  
High Voltage Power Supply ◽  
Automatic Adjustment ◽  
Design Goal ◽  
Welding Technology

A 60kV/6kW full-digital high voltage power supply for electronic beam welder (EBW) is designed. The power is composed of DSP, CPLD, IPM etc. It has realized the automatic adjustment of high voltage, over-voltage and over-current protection, and rapid recovery from high voltage self-discharge. The test proves that high voltage power supply has reached design goal and satisfied the actual requirements of welding technology.

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