New replica method with plasma polymerized film by glow discharge

Author(s):  
A. Tanaka ◽  
M. Yamaguchi ◽  
T. Hirano

The plasma polymerization replica method and its apparatus have been devised by Tanaka (1-3). We have published several reports on its application: surface replicas of biological and inorganic specimens, replicas of freeze-fractured tissues and metal-extraction replicas with immunocytochemical markers.The apparatus for plasma polymerization consists of a high voltage power supply, a vacuum chamber containing a hydrocarbon gas (naphthalene, methane, ethylene), and electrodes of an anode disk and a cathode of the specimen base. The surface replication by plasma polymerization in negative glow phase on the cathode was carried out by gassing at 0.05-0.1 Torr and glow discharging at 1.5-3 kV D.C. Ionized hydrocarbon molecules diffused into complex surface configurations and deposited as a three-dimensionally polymerized film of 1050 nm in thickness.The resulting film on the complex surface had uniform thickness and showed no granular texture. Since the film was chemically inert, resistant to heat and mecanically strong, it could be treated with almost any organic or inorganic solvents.

Particles ◽  
2018 ◽  
Vol 1 (1) ◽  
pp. 12 ◽  
Author(s):  
Nobuyuki Nishimori ◽  
Ryoji Nagai ◽  
Masaru Sawamura ◽  
Ryoichi Hajima

We have developed a photocathode dc gun for a compact Smith-Purcell free-electron laser in the terahertz wavelength region. The gun system consists of an alkali antimonide photocathode preparation chamber, a dc gun with a 250 kV-50 mA Cockcroft-Walton high-voltage power supply, and a downstream beamline with a water-cooled beam dump to accommodate a beam power of 5 kW. We fabricated a Cs3Sb photocathode with quantum efficiency of 5.8% at a wavelength of 532 nm and generated a 150 keV beam with current of up to 4.3 mA with a 500 mW laser. A vacuum chamber for the Smith-Purcell free-electron laser has been installed in the downstream beamline. We describe the present status of our work.


Author(s):  
Hirano T. ◽  
M. Yamaguchi ◽  
M. Hayashi ◽  
Y. Sekiguchi ◽  
A. Tanaka

A plasma polymerization film replica method is a new high resolution replica technique devised by Tanaka et al. in 1978. It has been developed for investigation of the three dimensional ultrastructure in biological or nonbiological specimens with the transmission electron microscope. This method is based on direct observation of the single-stage replica film, which was obtained by directly coating on the specimen surface. A plasma polymerization film was deposited by gaseous hydrocarbon monomer in a glow discharge.The present study further developed the freeze fracture method by means of a plasma polymerization film produces a three dimensional replica of chemically untreated cells and provides a clear evidence of fine structure of the yeast plasma membrane, especially the dynamic aspect of the structure of invagination (Figure 1).


Materials ◽  
2021 ◽  
Vol 14 (5) ◽  
pp. 1228
Author(s):  
Marcin Winnicki ◽  
Artur Wiatrowski ◽  
Michał Mazur

High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.


2013 ◽  
Vol 846-847 ◽  
pp. 190-194
Author(s):  
Shu Jun Yin ◽  
Xue Ren Li ◽  
Ji Geng Luo

The paper designs a three-phase high voltage power supply system based on active disturbance rejection controller which make single-chip microcomputer ATmega128 as the main control chip and the system improve the stability and control precision of dust removing power. Engineering practice shows that, the DC power supply system has the advantages of convenient operation, high work efficiency, system stability.


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