Passivation Study of InAs/GaSb Type-II Strained Layer Superlattice in Mid-wave Infrared Photodetector

2020 ◽  
Vol 77 (9) ◽  
pp. 714-718
Author(s):  
Ha Sul Kim
Micromachines ◽  
2020 ◽  
Vol 11 (11) ◽  
pp. 958 ◽  
Author(s):  
David Z. Ting ◽  
Sir B. Rafol ◽  
Arezou Khoshakhlagh ◽  
Alexander Soibel ◽  
Sam A. Keo ◽  
...  

The InAs/InAsSb (Gallium-free) type-II strained-layer superlattice (T2SLS) has emerged in the last decade as a viable infrared detector material with a continuously adjustable band gap capable of accommodating detector cutoff wavelengths ranging from 4 to 15 µm and beyond. When coupled with the unipolar barrier infrared detector architecture, the InAs/InAsSb T2SLS mid-wavelength infrared (MWIR) focal plane array (FPA) has demonstrated a significantly higher operating temperature than InSb FPA, a major incumbent technology. In this brief review paper, we describe the emergence of the InAs/InAsSb T2SLS infrared photodetector technology, point out its advantages and disadvantages, and survey its recent development.


2019 ◽  
Vol 48 (10) ◽  
pp. 6145-6151 ◽  
Author(s):  
David Z. Ting ◽  
Alexander Soibel ◽  
Arezou Khoshakhlagh ◽  
Sam A. Keo ◽  
Sir B. Rafol ◽  
...  

Author(s):  
Kenneth W. Allen ◽  
Joshua M. Duran ◽  
Gamini Ariyawansa ◽  
Jarrett H. Vella ◽  
Nicholaos I. Limberopoulos ◽  
...  

2008 ◽  
Author(s):  
L. Zheng ◽  
M. Z. Tidrow ◽  
A. Novello ◽  
H. Weichel ◽  
S. Vohra

2011 ◽  
Vol 334 (1) ◽  
pp. 103-107 ◽  
Author(s):  
S.P. Svensson ◽  
D. Donetsky ◽  
D. Wang ◽  
H. Hier ◽  
F.J. Crowne ◽  
...  

2010 ◽  
Author(s):  
A. Hood ◽  
A. J. Evans ◽  
A. Ikhlassi ◽  
G. Sullivan ◽  
E. Piquette ◽  
...  

Author(s):  
E. Meyer ◽  
K. Banerjee ◽  
S. Ghosh

A type II indium arsenide / gallium antimonide (InAs-GaSb) strained layer superlattice (SLS) semiconductor is optimal for detecting long wavelength infrared (LWIR) signals for infrared imaging applications. However, as with all crystal structures dangling bonds at the surface of the semiconductor must be pacified with a passivant to maintain the integrity of the semiconductor. We report the most effective passivation layer for this III-V semiconductor by examining both the material and device characteristics of the devices pacified by silicon dioxide (SiO2), silicon nitride (SixNy), and zinc sulfide (ZnS). Our final reporting shows ZnS with a pre-passivation of ammonium sulfide ((NH4)2S) as being the most effective passivant.


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