Initialization Time Test and Analysis about the Control Unit of Fuel Cell Vehicle

2013 ◽  
Vol 419 ◽  
pp. 505-510
Author(s):  
Chao Wu ◽  
Wei Ming Liang ◽  
Xu Nian Lai ◽  
Fen Liu

The paper introduces the test process of the initialization time of the control unit of Fuel cell vehicle (FCV), including connecting to the high-voltage power supply speedily, connecting to the high-voltage power supply with normal steps, and correspondent vehicle testing and hardware in the loop (HIL) bench testing. By analyzing the hard-wired signal such as key location data from data collection device and by analyzing vehicle CAN signal, the test obtained the general initialization time of each control unit and their correspondent systems, and the time needed for speedy connection to high-voltage power supply, and sorted out the determining negative factor of speedy high-voltage connection. This test could obtain implicit system parameters, which might be referred to when improving vehicle properties.

Materials ◽  
2021 ◽  
Vol 14 (5) ◽  
pp. 1228
Author(s):  
Marcin Winnicki ◽  
Artur Wiatrowski ◽  
Michał Mazur

High Power Impulse Magnetron Sputtering (HiPIMS) was used for deposition of indium tin oxide (ITO) transparent thin films at low substrate temperature. A hybrid-type composite target was self-prepared by low-pressure cold spraying process. Prior to spraying In2O3 and oxidized Sn powders were mixed in a volume ratio of 3:1. Composite In2O3/Sn coating had a mean thickness of 900 µm. HiPIMS process was performed in various mixtures of Ar:O2: (i) 100:0 vol.%, (ii) 90:10 vol.%, (iii) 75:25 vol.%, (iv) 50:50 vol.%, and (v) 0:100 vol.%. Oxygen rich atmosphere was necessary to oxidize tin atoms. Self-design, simple high voltage power switch capable of charging the 20 µF capacitor bank from external high voltage power supply worked as a power supply for an unbalanced magnetron source. ITO thin films with thickness in the range of 30–40 nm were obtained after 300 deposition pulses of 900 V and deposition time of 900 s. The highest transmission of 88% at λ = 550 nm provided 0:100 vol. % Ar:O2 mixture, together with the lowest resistivity of 0.03 Ω·cm.


2011 ◽  
Vol 383-390 ◽  
pp. 4306-4311
Author(s):  
Sheng Wen Fan ◽  
Ze Ting Wang

A 60kV/6kW full-digital high voltage power supply for electronic beam welder (EBW) is designed. The power is composed of DSP, CPLD, IPM etc. It has realized the automatic adjustment of high voltage, over-voltage and over-current protection, and rapid recovery from high voltage self-discharge. The test proves that high voltage power supply has reached design goal and satisfied the actual requirements of welding technology.


Electronics ◽  
2021 ◽  
Vol 10 (17) ◽  
pp. 2119
Author(s):  
Chi-Feng Su ◽  
Chih-Tung Liu ◽  
Jong-Shinn Wu ◽  
Ming-Tzu Ho

This paper presents the design and implementation of a miniaturized high-voltage power supply with power factor correction (PFC) for atmospheric-pressure plasma jet (APPJ) applications. The sinusoidal output frequency and voltage of the power supply can be controlled independently from 16 to 24 kHz and from 1 to 10 kVpeak, respectively. A helium APPJ load is used to assess the performance of the developed power supply. It is shown that the developed high-voltage power supply operates effectively, and the designed PFC converter improves the input current distortion of the power supply. Not only the power factor of the power supply is increased from 0.41 to 0.95, but it also provides a low-ripple DC voltage, which reduces the high-voltage ripple of the output from 730 to 50 Vp-p. In this paper, the proposed design integrates the PFC converter into the high-voltage power supply so that the developed power supply has better electrical characteristics and the overall power supply can be significantly miniaturized.


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