Research on the Preparation Methods of Silicon Oxide Thin Films

2011 ◽  
Vol 233-235 ◽  
pp. 2556-2560
Author(s):  
Chun Wei Li ◽  
Qun Li Zhang ◽  
Shu Yan Xu ◽  
Gui Ying Wang

Silicon oxide thin films have many excellent properties such as hardness, optical,dielectric properties,wear-resistance and corrosion-resistance. It has been widely used in optical and microelectronic applications. The preparation methods mainly include phsical vapor deposition and chemical vapor deposition.The paper reviews a few preparation methods of silicon oxide thin films, and compares advantages and disadvantages w ith each other. On the other hand,it point out the tendency of development.

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