Post-Annealing Effects on the Surface Roughness of Undoped and Al-Doped ZnO Thin Films Deposited by Atomic Layer Deposition
2013 ◽
Vol 734-737
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pp. 2492-2495
Keyword(s):
The post-annealing effects on the surface morphological changes of undoped and Al-doped ZnO (ZnO:Al) thin films deposited by atomic layer deposition (ALD) were investigated. The as-grown films were deposited by ALD at growth temperature of 200°C and also, post-annealing of the samples was accomplished at 300°C for 1 h under nitrogen atmosphere. The X-ray diffraction of the films was monitored to study the crystallinity of the films according to post-anneal. The field emission-scanning electron microscopy and atomic force microscopy were conducted to observe the surface morphological changes and measure the root-mean-square roughness of the films in order to analysis the post-annealing effects on the surface roughness of the films.
2001 ◽
Vol 65
(1-4)
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pp. 125-132
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2018 ◽
Vol 39
(3)
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pp. 033004
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2012 ◽
Vol 30
(2)
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pp. 021202
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1997 ◽
Vol 49
(1-4)
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pp. 19-26
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Keyword(s):
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2017 ◽
Vol 122
(1)
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pp. 377-385
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2009 ◽
Vol 22
(2)
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pp. 137-141
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2007 ◽
Vol 42
(1-6)
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pp. 172-175
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