Fabrication and Magneto-Transport Properties of Zn0.88-xMgxMn0.12O/ZnO Heterostructures Grown on ZnO Single-Crystal Substrates

2010 ◽  
Vol 75 ◽  
pp. 1-8
Author(s):  
Keiichiro Masuko ◽  
Tatsuru Nakamura ◽  
Atsushi Ashida ◽  
Takeshi Yoshimura ◽  
Norifumi Fujimura

The transport properties of Zn0.88-xMgxMn0.12O/ZnO modulation-doped heterostructures (x≤0.15) were investigated. The heterostructures were fabricated on ZnO single-crystal substrates by a pulsed laser deposition system. Atomic force microscope observation and X-ray diffraction analysis suggested that Zn0.88-xMgxMn0.12O layers have atomically flat surface and excellent crystallinity. The results of Hall measurement for Zn0.88-xMgxMn0.12O/ZnO modulation-doped heterostructure with x=0.075 revealed that the carrier concentration and the electron mobility were 5.1×1012cm-2 and 800 cm2/Vs at 10 K, respectively, suggesting that the carrier confinement effect exits at the heterointerface between Zn0.88-xMgxMn0.12O barrier layer and ZnO channel layer. In the magnetoresistance (MR) measurement at 1.85 K, a positive MR behavior was observed below 0.5 T, while a negative MR behavior was recognized above 0.5 T. The slope of the positive MR decreased with increasing the temperature and was well fitted to the Brillouin function with S=5/2. The electrical and magneto-transport properties were very similar to those of Zn0.88Mn0.12O/ZnO heterostructures without doping Mg.

2012 ◽  
Vol 733 ◽  
pp. 232-235 ◽  
Author(s):  
X.D. Xue ◽  
T. Wang ◽  
J. Jiang ◽  
P.H. Li ◽  
Y.F. Liu ◽  
...  

Hydrogen-induced defects of ZnO single crystals electrochemically charged with hydrogen have been investigated by positron beam-based Doppler broadening spectroscopy, X-ray diffraction (XRD) and optical microscopy (OM). XRD and OM results indicated that a deformation layer was formed due to hydrogen-induced structural change at the subsurface of ZnO single crystal. Slow positron beam measurements showed that this deformation layer contained many defects, such as dislocations and Zn vacancies, which led to increase of S parameter.


2013 ◽  
Vol 853 ◽  
pp. 131-134
Author(s):  
Tao Tang ◽  
Yi Liu ◽  
Qun Li ◽  
Jiang Li Cao ◽  
Yu Zhe Liu ◽  
...  

B2 ordered FeAl intermetallic is an important candidate for high-temperaturestructural materials, and its hydrogen embrittlement problem has attracted wide attentions in recent decades. In this paper, we prepared single-crystal-like B2-FeAl (111) thin films on Si (111) substrate using the conventional magnetron sputtering method, and studied the phase composition and the influences of hydrogen on FeAl (111) films by X-ray diffraction (XRD), scanning electron microscopy (SEM), Atomic force microscope (AFM) and transmission electron microscope (TEM) analysis. The preffered growth mechanism of FeAl (111) film and its hydrogen induced modification were discussed.


2009 ◽  
Vol 1222 ◽  
Author(s):  
Hom R Kandel ◽  
Tar-Pin Chen ◽  
Hye-Won Seo ◽  
Milko Iliev ◽  
Paritosh Wadekar ◽  
...  

AbstractWe have fabricated highly resistive materials PrBa2 (Cu1-xMx) 3O7 (M=Al, Ga, x = 0.20) by doping metals Ga and Al on PrBa2Cu3O7(PBCO). X-ray data indicated no significant second phases in substituting Cu by Al or Ga up to 20%.The electrical resistivity of these materials were three to four orders in magnitude higher than PBCO at 200K, which may give an effective potential barrier to YBCO in high Tc S-I-S Josephson junction. Epitaxial thin films of these materials were grown using KrF excimer laser on LAO (110) single crystal substrates. X-ray diffraction (XRD) and atomic force microscopy (AFM) were deployed to study the crystal orientation, epitaxy and roughness of the single crystal thin films. Micro Raman spectroscopy was carried out to investigate the dopant site in PBCO.


2014 ◽  
Vol 70 (a1) ◽  
pp. C1417-C1417
Author(s):  
Gabriel Juarez Diaz ◽  
Javier Martinez Juarez ◽  
Ramon Peña Sierra ◽  
Primavera Lopez Salazar ◽  
Jorge Contreras Rascon ◽  
...  

We present the optical and structural study of the antimony doped zinc oxide (ZnO) performed by atomic diffusion. Diffusion is carried out at a temperature of 10000C for periods of 1, 2 and 4 hrs from a solid source prepared by partial oxidation of antimony, characterizing each step of the process was performed by photoluminescence (PL) and x-ray diffraction (XRD). The characterization by photoluminescence shows the effect of doping with antimony in radiative transitions caused by the creation of impurity levels. Doped samples were analyzed by high resolution diffraction and reciprocal space mapping which revealed the structural modification of the quality of the single crystal produced by the introduction of antimony. The results indicate that the antimony is introduced fully the volume of ZnO and does not modify the quality of the crystal.


Clay Minerals ◽  
2001 ◽  
Vol 36 (3) ◽  
pp. 421-433 ◽  
Author(s):  
E. Benincasa ◽  
M. F. Brigatti ◽  
L. Medici ◽  
L. Poppi

AbstractRectorite crystals [[4](Si6.81Al1.19)[6](Al3.26Ti0.04Fe0.553+Mg0.18Mn0.01)[12](Na0.02K0.88 Mg0.16Ca0.01)O20(OH)4·0.75H2O] found in micaschist of the Sesia-Lanzo Zone (NW Italy) were studied using a variety of techniques including microprobe analysis, infrared spectroscopy, single crystal and powder X-ray diffraction, atomic force microscopy and thermal analysis. Chemical data and exchangeable cation determination indicate that K+ is the dominant non-exchangeable interlayer cation, and thus is believed to occupy the mica interlayer site; Mg2+ together with small amounts of Ca2+, Na+ and K+ represent the exchangeable cations and can therefore be related to the smectite-like component. The coefficient of variation, CV, of d(00l) values (CVnatural = 0.47; CVglycolated = 0.43) demonstrates the regularity of the mica-smectite interstratification, whereas the unit-cell parameters obtained by single crystal methods suggest different layer-stacking models.


Author(s):  
J. M. Galbraith ◽  
L. E. Murr ◽  
A. L. Stevens

Uniaxial compression tests and hydrostatic tests at pressures up to 27 kbars have been performed to determine operating slip systems in single crystal and polycrystal1ine beryllium. A recent study has been made of wave propagation in single crystal beryllium by shock loading to selectively activate various slip systems, and this has been followed by a study of wave propagation and spallation in textured, polycrystal1ine beryllium. An alteration in the X-ray diffraction pattern has been noted after shock loading, but this alteration has not yet been correlated with any structural change occurring during shock loading of polycrystal1ine beryllium.This study is being conducted in an effort to characterize the effects of shock loading on textured, polycrystal1ine beryllium. Samples were fabricated from a billet of Kawecki-Berylco hot pressed HP-10 beryllium.


Author(s):  
Süheyla Özbey ◽  
F. B. Kaynak ◽  
M. Toğrul ◽  
N. Demirel ◽  
H. Hoşgören

AbstractA new type of inclusion complex, S(–)-1 phenyl ethyl ammonium percholorate complex of R-(–)-2-ethyl - N - benzyl - 4, 7, 10, 13 - tetraoxa -1- azacyclopentadecane, has been prepared and studied by NMR, IR and single crystal X-ray diffraction techniques. The compound crystallizes in space group


2003 ◽  
Vol 780 ◽  
Author(s):  
C. Essary ◽  
V. Craciun ◽  
J. M. Howard ◽  
R. K. Singh

AbstractHf metal thin films were deposited on Si substrates using a pulsed laser deposition technique in vacuum and in ammonia ambients. The films were then oxidized at 400 °C in 300 Torr of O2. Half the samples were oxidized in the presence of ultraviolet (UV) radiation from a Hg lamp array. X-ray photoelectron spectroscopy, atomic force microscopy, and grazing angle X-ray diffraction were used to compare the crystallinity, roughness, and composition of the films. It has been found that UV radiation causes roughening of the films and also promotes crystallization at lower temperatures.Furthermore, increased silicon oxidation at the interface was noted with the UVirradiated samples and was shown to be in the form of a mixed layer using angle-resolved X-ray photoelectron spectroscopy. Incorporation of nitrogen into the film reduces the oxidation of the silicon interface.


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