Fabrication and Microstructural Change of PMN-PT Thin Films on Si Substrates by PLD with Mask and Double-Pulse Lazer Excitation
2007 ◽
Vol 350
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pp. 111-114
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Keyword(s):
Epitaxial Pb(Mg1/3Nb2/3)O3-PbTiO3 (PMN-PT) thin films were fabricated on (La,Sr)CoO3/CeO2/ YSZ coated Si substrates by double-pulse excitation PLD with and without a mask. For double-pulse excitation PLD without a mask in conditions of Nd:YAG laser irradiation before defocused KrF-excimer-laser irradiation, the surface roughness of PMN-PT thin films was rather less than that of the films fabricated using Nd:YAG single laser PLD. Thin films with smoother surfaces were deposited at the high deposition rate of 5.6 nm·min-1 using the mask and the double-pulse excitation PLD method in conditions of irradiation of Nd:YAG laser after KrF excimer laser at 0.5 =s delays.
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1996 ◽
Vol 35
(Part 2, No. 11B)
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pp. L1473-L1475
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2013 ◽
Vol 210
(12)
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pp. 2729-2735
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2000 ◽
Vol 154-155
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pp. 622-626
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Keyword(s):
2011 ◽
Vol 38
(1)
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pp. 0106002
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1999 ◽
Vol 107
(1252)
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pp. 1229-1231
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1999 ◽
Vol 138-139
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pp. 145-149
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1990 ◽
Vol 5
(12)
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pp. 2835-2840
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