Effect of N2 Flow Rate on Structure and Mechanical Properties of CrN Coatings Prepared by Closed Field Unbalanced Magnetron Sputtering

2013 ◽  
Vol 591 ◽  
pp. 95-98 ◽  
Author(s):  
Hao Zhang ◽  
Shu Wang Duo ◽  
Xiang Min Xu ◽  
Ting Zhi Liu
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Closed Field ◽  
Nitrogen Flow ◽  
Columnar Crystal ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Crystal Preferred Orientation ◽  
Crn Coatings

CrN coatings were deposited by Closed Filed Unbalanced Magnetron Sputtering (CFUMS). The effect of N2 flow rate on composition, phase components, morphologies and mechanical properties of CrN coatings were studied. The results show that the deposition rate of CrN coatings declined with the increase of nitrogen flow percentage in a Ar/N2 mixture atmosphere. When the nitrogen flow percentage reached 50% or more, the Cr and N atomic ratio of CrN coatings is close to 1:1. The phase in coatings was the coexistence of Cr, Cr2N and CrN, but the crystal preferred orientation changed significantly with the different N2 flow rates. The columnar crystal CrN coating with low N2 flow rate was denser. The hardness and adhension of CrN coatings have no direct relationship with N2 flow rate.

Effect of Temperature on Structure and Mechanical Properties of CrN Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering

2013 ◽  
Vol 591 ◽  
pp. 190-193
Author(s):  
Hao Zhang ◽  
Shu Wang Duo ◽  
Xiang Min Xu ◽  
Ting Zhi Liu
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Grain Shape ◽  
Effect Of Temperature ◽  
Closed Field ◽  
Columnar Crystal ◽  
Crn Coating ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Crn Coatings

CrN coatings were fabricated by Closed Filed Unbalanced Magnetron Sputtering (CFUMS). The effect of substrate temperature (TS) on phase components, morphologies and mechanical properties of CrN coatings were studied. The results show that the phase in coatings, which has little to do with TS, was the coexistence of Cr, Cr2N and CrN. The grain shape of the columnar crystal CrN coating was the coexistence of pyramidal and plane topography. The hardness and adhension of CrN coating first increased with the rise of temperature, then decreased when the values of both them were constant ones. It has the highest hardness and bonding strength simultaneously at 300°C.

scholarly journals Structure and Properties of Nanocrystalline (TiZr)xN1−xThin Films Deposited by DC Unbalanced Magnetron Sputtering

2016 ◽  
Vol 2016 ◽  
pp. 1-12 ◽  
Author(s):  
Yu-Wei Lin ◽  
Chia-Wei Lu ◽  
Ge-Ping Yu ◽  
Jia-Hong Huang
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
X Ray Diffraction ◽  
Nitrogen Flow Rate ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

This study aims to investigate the effects of nitrogen flow rate (0–2.5 sccm) on the structure and properties of TiZrN films. Nanocrystalline TiZrN thin films were deposited on Si (001) substrates by unbalanced magnetron sputtering. The major effects of the nitrogen flow rate were on the phase, texture, N/(Ti + Zr) ratio, thickness, hardness, residual stress, and resistivity of the TiZrN films. The nitrogen content played an important role in the phase transition. With increasing nitrogen flow rate, the phase changed from mixed TiZr and TiZrN phases to a single TiZrN phase. The X-ray diffraction results indicated that (111) was the preferred orientation for all TiZrN specimens. The N/(Ti + Zr) ratio of the TiZrN films first increased with increasing nitrogen flow rate and then stabilized when the flow rate further increased. When the nitrogen flow rate increased from 0.4 to 1.0 sccm, the hardness and residual stress of the TiZrN thin film increased, whereas the electrical resistivity decreased. None of the properties of the TiZrN thin films changed with nitrogen flow rate above 1.0 sccm because the films contained a stable single phase (TiZrN). At high nitrogen flow rates (1.0–2.5 sccm), the average hardness and resistivity of the TiZrN thin films were approximately 36 GPa and 36.5 μΩ·cm, respectively.

The Influences of Process Parameters on Properties of CrNx Coatings Deposited by Closed Field Unbalanced Magnetron Sputtering

2014 ◽  
Vol 908 ◽  
pp. 38-41
Author(s):  
Xiang Min Xu ◽  
Hao Zhang ◽  
Yi Bin Jin ◽  
Hao Chen Zhang ◽  
Shu Wang Duo
Keyword(s):  
Magnetron Sputtering ◽  
Bias Voltage ◽  
Process Parameters ◽  
Flux Ratio ◽  
Preferred Orientation ◽  
Closed Field ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Surface Morphologies ◽  
Crn Coatings

CrNx coatings were prepared by closed filed unbalanced magnetron sputtering (CFUMS), and the effects of N2 flux ratio and bias voltage on CrN coatings were investigated. Results showed that the phase in coatings was the coexistence of CrN, Cr2N and Cr, and CrN(111) always showed an intensive preferred orientation in both cases, but CrN(200) enhanced with the rise of bias voltage. The hardness of coatings decreased with an increasing N2 flux ratio, while improved with an increasing bias voltage. The grain edges were polished off and the boundaries became blurred when higher bias voltage was applied. All in all, the surface morphologies of CrN coatings became flatter and denser with both increasing N2 content and bias voltage, respectively.

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