Effect of nitrogen flow rate on structure and properties of nanocrystalline TiN thin films produced by unbalanced magnetron sputtering

2005 ◽  
Vol 191 (1) ◽  
pp. 17-24 ◽  
Author(s):  
Jia-Hong Huang ◽  
Kiang-Wee Lau ◽  
Ge-Ping Yu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
Nitrogen Flow Rate ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Tin Thin Films

scholarly journals Structure and Properties of Nanocrystalline (TiZr)xN1−xThin Films Deposited by DC Unbalanced Magnetron Sputtering

2016 ◽  
Vol 2016 ◽  
pp. 1-12 ◽  
Author(s):  
Yu-Wei Lin ◽  
Chia-Wei Lu ◽  
Ge-Ping Yu ◽  
Jia-Hong Huang
Keyword(s):  
Thin Films ◽  
Residual Stress ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
X Ray Diffraction ◽  
Nitrogen Flow Rate ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron

This study aims to investigate the effects of nitrogen flow rate (0–2.5 sccm) on the structure and properties of TiZrN films. Nanocrystalline TiZrN thin films were deposited on Si (001) substrates by unbalanced magnetron sputtering. The major effects of the nitrogen flow rate were on the phase, texture, N/(Ti + Zr) ratio, thickness, hardness, residual stress, and resistivity of the TiZrN films. The nitrogen content played an important role in the phase transition. With increasing nitrogen flow rate, the phase changed from mixed TiZr and TiZrN phases to a single TiZrN phase. The X-ray diffraction results indicated that (111) was the preferred orientation for all TiZrN specimens. The N/(Ti + Zr) ratio of the TiZrN films first increased with increasing nitrogen flow rate and then stabilized when the flow rate further increased. When the nitrogen flow rate increased from 0.4 to 1.0 sccm, the hardness and residual stress of the TiZrN thin film increased, whereas the electrical resistivity decreased. None of the properties of the TiZrN thin films changed with nitrogen flow rate above 1.0 sccm because the films contained a stable single phase (TiZrN). At high nitrogen flow rates (1.0–2.5 sccm), the average hardness and resistivity of the TiZrN thin films were approximately 36 GPa and 36.5 μΩ·cm, respectively.

Effect of Nitrogen Flow Rate on the Structure and Properties of TiN Thin Films Deposited onto β-Type Ti-15Mo-3Nb-3Al-0.2Si Alloy Substrates by Reactive Magnetron Sputtering

2012 ◽  
Vol 557-559 ◽  
pp. 1998-2001 ◽  
Author(s):  
Jun Hee Lee ◽  
A. Joseph Nathanael ◽  
Sun Ig Hong
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Nitrogen Concentration ◽  
Rf Magnetron Sputtering ◽  
Nitrogen Flow ◽  
Structure And Properties ◽  
Nitrogen Flow Rate ◽  
Average Roughness ◽  
Tin Thin Films

Titanium Nitride (TiN) thin film was deposited on β-type Ti-15Mo-3Nb-3Al-0.2Si alloy plates by RF magnetron sputtering method. The effect of nitrogen flow rate on the structure and properties of the TiN thin films were studied. The preferred orientation of TiN thin films changed from (111) to (200) as the nitrogen flow rate increased due to the effect of the kinetic energy of the bombarding particles. The coating thickness was found to decrease with increasing nitrogen concentration, which also favors (200) orientation with increasing nitrogen flow rate. With increase of nitrogen flow, the morphology of the TiN thin films films changed from characteristic pyramidal shaped grains to columnar-shaped grains. The roughness analysis of the coating shows that the average roughness of the coating decreased with increasing nitrogen flow rate. The increase of hardness with increasing nitrogen flow rate is attributed to the decrease in grain size.

Investigation of Mechanical and Structural Properties of AlN Thin Films Prepared by Mid-Frequency Pulsed Magnetron Sputtering

2007 ◽  
Vol 561-565 ◽  
pp. 1185-1188 ◽  
Author(s):  
Zong Xin Mu ◽  
Ai Min Wu ◽  
Li Jia ◽  
Zhen Wei Wang ◽  
Hua Yu Zhao ◽  
...  
Keyword(s):  
Thin Films ◽  
Surface Morphology ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Film Growth ◽  
Root Mean Square Roughness ◽  
Gas Mixture ◽  
Nitrogen Flow ◽  
Nitrogen Flow Rate ◽  
Pulsed Magnetron

In this work, we investigated the deposition of the AlN thin films on silicon (100) substrates by mid-frequency pulsed magnetron sputtering of a metal Al target in an Ar-N2 gas mixture at room temperature. The films were characterized by various means for the composition, the crystal structure, the surface morphology, and the hardness and Young’s modulus. AFM surface RMS (root mean square) roughness analysis revealed that the surface morphology has relation with the nitrogen flow rate in the Ar–N2 gas mixture. The highest surface smoothness was observed at the nitrogen flow rate of 30-50%. The phenomenon was interpreted by the action of the vapor-solid interface on the film growth, as well as the nonequilibrium processes occurred in the film growth.

Effect of N2 Flow Rate on Structure and Mechanical Properties of CrN Coatings Prepared by Closed Field Unbalanced Magnetron Sputtering

2013 ◽  
Vol 591 ◽  
pp. 95-98 ◽  
Author(s):  
Hao Zhang ◽  
Shu Wang Duo ◽  
Xiang Min Xu ◽  
Ting Zhi Liu
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Closed Field ◽  
Nitrogen Flow ◽  
Columnar Crystal ◽  
Unbalanced Magnetron Sputtering ◽  
Unbalanced Magnetron ◽  
Crystal Preferred Orientation ◽  
Crn Coatings

CrN coatings were deposited by Closed Filed Unbalanced Magnetron Sputtering (CFUMS). The effect of N2 flow rate on composition, phase components, morphologies and mechanical properties of CrN coatings were studied. The results show that the deposition rate of CrN coatings declined with the increase of nitrogen flow percentage in a Ar/N2 mixture atmosphere. When the nitrogen flow percentage reached 50% or more, the Cr and N atomic ratio of CrN coatings is close to 1:1. The phase in coatings was the coexistence of Cr, Cr2N and CrN, but the crystal preferred orientation changed significantly with the different N2 flow rates. The columnar crystal CrN coating with low N2 flow rate was denser. The hardness and adhension of CrN coatings have no direct relationship with N2 flow rate.

Sign in / Sign up

Export Citation Format

Share Document