Electron Beam-Induced Nano-Deposition Using a Transmission Electron Microscope

2005 ◽  
Vol 480-481 ◽  
pp. 129-132 ◽  
Author(s):  
Masayuki Shimojo ◽  
Kazutaka Mitsuishi ◽  
M. Tanaka ◽  
M. Song ◽  
Kazuo Furuya
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Transmission Electron Microscope ◽  
High Resolution Electron Microscopy ◽  
Scanning Transmission Electron Microscope ◽  
Beam Position ◽  
Nano Crystalline ◽  
Transmission Electron ◽  
Resolution Electron ◽  
Scanning Transmission

Nanometre-sized structures were fabricated by electron beam-induced deposition in a scanning transmission electron microscope. A small amount of metal-organic gases, W(CO)6 and dimethyl acetylacetonato gold, were introduced near a substrate in the chamber of the microscope. The gas was decomposed by the irradiation of focused electron beams and nanometre-sized deposits containing W or Au were produced. Moving the beam position enables us to produce structures with a variety of shapes. High-resolution electron microscopy observation revealed that the structures consisted of nano-crystalline and amorphous parts.

Cutting of 20 Å holes and lines in metal-β-aluminas

1983 ◽  
Vol 41 ◽  
pp. 100-101 ◽  
Author(s):  
M.E. Mochel ◽  
C. J. Humphreys ◽  
J. M. Mochel ◽  
J. A. Eades
Keyword(s):  
Electron Beam ◽  
Electron Microscope ◽  
Transmission Electron Microscope ◽  
Carbon Film ◽  
Scanning Transmission Electron Microscope ◽  
High Electron ◽  
Transmission Electron ◽  
Solid Substrates ◽  
Scanning Transmission ◽  
Very High

Holes 20 Å in diameter and fine lines 20 Å wide can be cut in the metal-β-aluminas using the 10 Å electron beam of the Vacuum Generators, HB5 scanning transmission electron microscope. The minimum current density required for cutting was 103 amp/cm2. Electron energies of 40,60,80,100 keV were used.This technique has higher resolution than current lithography methods and is direct, requiring no chemical development. The width of isolated lines made on solid substrates is currently about .1μm (Ahmed and McMahon, 1981) and .03μm (Jackel et al., 1980). M. Isaacson and A. Murry have carried out electron beam writing on NaCl crystals supported on a carbon film on the scale we report here.In our case uniform 20Å holes and lines can be cut through self-supporting 1000A thick slabs of sodium-β-alumina to provide very high electron contrast. Once cut, the β-aluminas are stable and will tolerate exposure to air without degradation of the electron cut patterns. They may be used directly as masks (eg. for ion implantation). We believe they could be cut on the substrate with no damage to the underlying material.

Study of Structural Defects in CdZnTe Crystals by High Resolution Electron Microscopy

2011 ◽  
Vol 1341 ◽  
Author(s):  
A. Hossain ◽  
A. E. Bolotnikov ◽  
G. S. Camarda ◽  
Y. Cui ◽  
R. Gul ◽  
...  
Keyword(s):  
Electron Microscopy ◽  
Electron Microscope ◽  
High Resolution ◽  
High Resolution Electron Microscopy ◽  
Scanning Transmission Electron Microscope ◽  
Structural Defects ◽  
Transmission Electron ◽  
Resolution Electron ◽  
Scanning Transmission ◽  
Infrared Microscope

ABSTRACTWe investigated defects in CdZnTe crystals produced from various conditions and their impact on fabricated devices. In this study, we employed transmission and scanning transmission electron microscope (TEM and STEM), because defects at the nano-scale are not observed readily under an optical or infrared microscope, or by most other techniques. Our approach revealed several types of defects in the crystals, such as low-angle boundaries, dislocations and precipitates, which likely are major causes in degrading the electrical properties of CdZnTe devices, and eventually limiting their performance.

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