Self-Lubricating Composite Coating on Air Foil Bearing Shaft by Hollow Cathode Plasma Jet

The self-lubricating composite films were deposited on Inconel 718 by Hollow Cathode Plasma Jet (HCPJ). These composite materials consist of chrome nickel alloy matrix and Ag, BaF2/CaF2 solid lubricants. The Cr2O3-NiCr-Ag composite thin film was crystallized and had the main peaks of Cr2O3 (012) and Ag (111). The deposition rate of 200 nm /min by HCPJ was much faster than the ordinary R.F planar magnetron sputtering. The surface roughness of coated shaft was 30 nm.

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Self-Lubricating Composite Coating on Air Foil Bearing Shaft by Hollow Cathode Plasma Jet

Materials Science Forum - Eco-Materials Processing & Design VI ◽

10.4028/0-87849-966-0.157 ◽

2005 ◽

pp. 157-160

Author(s):

Min Kyu Yang ◽

Hyu Seung Yang ◽

Jong Ku Park ◽

Keun Ryu ◽

Yong Bok Lee ◽

...

Keyword(s):

Composite Coating ◽

Hollow Cathode ◽

Plasma Jet ◽

Cathode Plasma ◽

Foil Bearing

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Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems

Plasma Processes and Polymers ◽

10.1002/ppap.200930611 ◽

2009 ◽

Vol 6 (S1) ◽

pp. S247-S252 ◽

Cited By ~ 3

Author(s):

Martin Čada ◽

Petr Virostko ◽

Štěpán Kment ◽

Zdeněk Hubička

Keyword(s):

Comparative Study ◽

Power Density ◽

Hollow Cathode ◽

Plasma Jet ◽

Total Power ◽

Cathode Plasma ◽

Pulsed Dc

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Deposition of electronic quality amorphous silicon,a-Si:H, thin films by a hollow cathode plasma-jet reactive sputtering system

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.1359537 ◽

2001 ◽

Vol 19 (4) ◽

pp. 1571-1576 ◽

Cited By ~ 19

Author(s):

G. Pribil ◽

Z. Hubička ◽

R. J. Soukup ◽

N. J. Ianno

Keyword(s):

Thin Films ◽

Amorphous Silicon ◽

Hollow Cathode ◽

Plasma Jet ◽

Reactive Sputtering ◽

Cathode Plasma ◽

Sputtering System

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Investigation of the rf and dc hollow cathode plasma-jet sputtering systems for the deposition of silicon thin films

Surface and Coatings Technology ◽

10.1016/s0257-8972(02)00389-4 ◽

2002 ◽

Vol 160 (2-3) ◽

pp. 114-123 ◽

Cited By ~ 21

Author(s):

Z. Hubička ◽

G. Pribil ◽

R.J. Soukup ◽

N.J. Ianno

Keyword(s):

Thin Films ◽

Hollow Cathode ◽

Plasma Jet ◽

Cathode Plasma ◽

Silicon Thin Films

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Finite Element Simulation on the Distribution of Discharge Gas in Hollow Cathode Plasma

Key Engineering Materials ◽

10.4028/www.scientific.net/kem.693.1054 ◽

2016 ◽

Vol 693 ◽

pp. 1054-1060

Author(s):

Yi Fang Wen ◽

Yan Nian Rui ◽

Hong Wei Wang

Keyword(s):

Thin Film ◽

Finite Element ◽

Surface Modification ◽

Hollow Cathode ◽

Fluid Distribution ◽

Large Area ◽

Cathode Plasma ◽

Plasma Surface Modification ◽

Plasma Surface ◽

Discharge Gas

The graft polymerization in radio frequency hollow cathode plasma (RFHCP) is suitable for the surface modification of large-area thin film materials. The homogeneity of plasma surface modification of large-area thin film materials has always been paid close attention, and it is also the key factor affecting the industrialized applications of the technique. However, the homogeneity of plasma surface modification is thought to depend greatly on the distribution of discharge gas. In this paper, a finite element model is proposed to discuss the flow of discharge gas in hollow cathode plasma. The concentration distribution of the discharge gas has been discussed by the combination of numerical simulation of fluid distribution and pipe flow theory based on the investigation of the transport property of gas under vacuum. Comparisons between available experiments have also been performed to validate the applicability and practicability of the proposed model.

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