Cutting Performances of Boron Doped Diamond-Coated Milling Tools in Machining Graphite

2011 ◽  
Vol 697-698 ◽  
pp. 458-461 ◽  
Author(s):  
Liang Wang ◽  
X.L. Lei ◽  
Bin Shen ◽  
Fang Hong Sun ◽  
Z.M. Zhang ◽  
...  
Keyword(s):  
Tool Life ◽  
Vapour Deposition ◽  
High Efficiency ◽  
Flank Wear ◽  
Chemical Vapour ◽  
Boron Doped Diamond ◽  
Boron Doped ◽  
Hot Filament ◽  
Milling Tools ◽  
Scanning Electron

In this investigation, conventional microcrystalline diamond (MCD) and boron doped diamond (BDD) films are deposited onto commercially available cemented tungsten carbide (WC-Co) Ball-nose endmills by using hot filament chemical vapour deposition (HFCVD). The quality and properties of the as-deposited diamond film are characterized by field emission scanning electron microscope (FESEM) and Raman spectroscopy. Milling tests of graphite materials using MCD, BDD coated and uncoated tool are carried out. Experiment results reveal that BDD films possess higher adhesive strength to the substrate than that of MCD films, and the BDD coated mills allow to be given smaller flank wear and longer tool life, when compared with MCD coated and uncoated WC-Co tools. Cutting performances of WC-Co mills in graphite milling are greatly improved by BDD coating, and typically more than 10 times the tool life is obtained. The research results are of great significance for high efficiency and quality machining of graphite materials.

scholarly journals Impact of chemical vapour deposition plasma inhomogeneity on the spatial variation of sp2 carbon in boron doped diamond electrodes

Carbon ◽  
2017 ◽  
Vol 121 ◽  
pp. 434-442 ◽  
Author(s):  
Zoë J. Ayres ◽  
Jonathan C. Newland ◽  
Mark E. Newton ◽  
Soumen Mandal ◽  
Oliver A. Williams ◽  
...  
Keyword(s):  
Spatial Variation ◽  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Diamond Electrodes ◽  
Boron Doped Diamond ◽  
Plasma Inhomogeneity ◽  
Boron Doped

Boron doped micro/nanocrystalline diamond electrodes used on the electrochemical flow reactor to degrade brilliant green dye

MRS Advances ◽  
2017 ◽  
Vol 2 (41) ◽  
pp. 2241-2246
Author(s):  
William D. Toledo ◽  
Lilian M. Silva ◽  
Marta Santos ◽  
André F. Sardinha ◽  
Neidenêi G. Ferreira
Keyword(s):  
Vapour Deposition ◽  
Brilliant Green ◽  
Flow Reactor ◽  
Chemical Vapour ◽  
Boron Doping ◽  
Absorption Bands ◽  
Flow Rates ◽  
Boron Doped ◽  
Current Densities ◽  
Hot Filament

ABSTRACTA systematic study was performed concerning the production, characterization, and application of BDD and BDND films grown on Ti substrate to degrade brilliant green dye using an electrochemical flow reactor. Films were grown in a hot filament chemical vapour deposition (HFCVD) reactor using H2/CH4 (BDD) and H2/CH4/Ar (BDND) gas mixtures. Boron doping was performed by dissolution of B2O3 in methanol in the appropriate B/C ratio to obtain good conductive electrodes. The electrolysis was carried out using BDD/Ti and BDND/Ti as anode material analyzing the influence of different current densities and flow rates. During the electrolysis, aliquots of the treated solution were analyzed by UV-Vis and Total Organic Carbon (TOC) measurements. The electrode efficiencies were compared considering the color removal as well as the TOC mineralization in the end of each electrolysis. The absorption bands intensity from UV/Vis spectra clearly decreased up to their completely vanishing at current density of 100 mA/cm2 for both electrodes. These results were corroborated by TOC measurements where 50% of the organic material was removed.

Structure and photoluminescence of boron-doped carbon nanoflakes grown by hot filament chemical vapour deposition

2015 ◽  
Vol 3 (5) ◽  
pp. 1106-1112 ◽  
Author(s):  
Biben Wang ◽  
Kostya (Ken) Ostrikov ◽  
Timothy van der Laan ◽  
Ruiwen Shao ◽  
Lin Li
Keyword(s):  
Chemical Vapor Deposition ◽  
Boron Carbide ◽  
Vapor Deposition ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Chemical Vapor ◽  
Boron Doped ◽  
Carbon Nanoflakes ◽  
Boron Source ◽  
Hot Filament

Boron-doped carbon nanoflakes were directly synthesized by hot filament chemical vapor deposition, nontoxic boron carbide was used as the boron source.

Cutting Performances of Boron-Doped Diamond Coated Milling Tools in Machining PCB

2012 ◽  
Vol 723 ◽  
pp. 280-285
Author(s):  
Liang Wang ◽  
Jian Guo Zhang ◽  
Bin Shen ◽  
Fang Hong Sun ◽  
Ming Chen
Keyword(s):  
Printed Circuit Board ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Circuit Board ◽  
Boron Doped Diamond ◽  
Workpiece Material ◽  
Boron Doped ◽  
Boron Source ◽  
Hot Filament ◽  
Milling Tools

Boron-doped diamond films are deposited on cobalt cemented tungsten carbide (WC-Co) printed circuit board (PCB) milling tools using hot filament chemical vapor deposition (HFCVD) method. Trimethyl borate is used as boron source. Scanning electron microscope (SEM) and Raman spectroscopy are used to characterize the as-deposited diamond films. To evaluate the cutting performances of as-fabricated boron-doped diamond (BDD) coated milling tools, milling tests are conducted using copper-clad laminate（CCL）as the workpiece material, compared with microcrystalline diamond (MCD) coated and uncoated milling tools. The experimental results show that the BDD films have strong adhesive strength to the substrate and can protect the cutting edge from rapid wearing out. The results suggest that depositing BDD coating on WC-Co milling tools is a viable way to improve their cutting performances in machining of PCB materials.

The Structure and Electrochemical Properties of BDD Deposited on Ti Substrate by MWCVD

2011 ◽  
Vol 189-193 ◽  
pp. 4267-4270
Author(s):  
Feng Liu ◽  
Wen Jun Wang ◽  
Jun Tao Wang ◽  
Li Wei Xiong ◽  
Yong Lei Xin ◽  
...  
Keyword(s):  
Vapour Deposition ◽  
Microwave Plasma ◽  
Chemical Vapour ◽  
Oxygen Demand ◽  
Water Electrolysis ◽  
X Ray Diffraction ◽  
Boron Doped Diamond ◽  
Boron Doped ◽  
Plasma Chemical Vapour Deposition ◽  
Evolution Of Oxygen

In this paper, Boron doped diamond (BDD) thin films have been deposited on Ti substrates by microwave plasma chemical vapour deposition (MWCVD). Raman spectroscopy scanning electron microscopy (SEM) and X-ray diffraction (XRD) examinations demonstrate that the electrode has well-defined diamond features. It is observed that the BDD electrode has a high overpotential 2.5V for water electrolysis prohibiting the evolution of oxygen in the cyclic voltammetry test. Further more，the removal efficiency of chemical oxygen demand (COD) is evaluated by the electrochemical oxidation of wastewater containing phenol.

Ultraviolet Photoresponse Properties of Zinc Oxide Nanorods on Heavily Boron-Doped Diamond Heterostructure

2013 ◽  
Vol 832 ◽  
pp. 172-177 ◽  
Author(s):  
Kim Guan Saw ◽  
Sau Siong Tneh ◽  
Swee Yong Pung ◽  
Sha Shiong Ng ◽  
F.K. Yam ◽  
...  
Keyword(s):  
Chemical Vapour Deposition ◽  
Vapour Deposition ◽  
Uv Light ◽  
Zno Nanorods ◽  
Chemical Vapour ◽  
Deposition Process ◽  
Zinc Oxide Nanorods ◽  
Boron Doped Diamond ◽  
Uv Illumination ◽  
Boron Doped

Heterostructures consisting of ZnO and diamond appear to have an elusive nature. A rectifying behaviour was previously observed only for heterojunctions with very lightly doped p-type diamond using residual boron gas during the chemical vapour deposition process or type IIb diamond. Other studies, however, claimed to obtain a rectifying behaviour for heterojunctions with p-type diamond with higher carrier densities between 1018 1019 cm-3. In this work we investigate the behaviour of n-type ZnO on heavily boron-doped p-type diamond. This heterostructure that is sensitive to UV light has been fabricated using ZnO nanorods grown on heavily boron-doped chemical vapour deposition diamond substrates. The I -V measurements show a rectifying characteristic. The threshold voltages under dark and UV conditions are 3.66 and 2.52 V, respectively. The UV illumination also results in an increased current flow. The electrical behaviour due to the UV illumination will be discussed.

scholarly journals Self-organized graphene-like boron nitride containing nanoflakes on copper by low-temperature N2 + H2 plasma

RSC Advances ◽  
2016 ◽  
Vol 6 (90) ◽  
pp. 87607-87615 ◽  
Author(s):  
B. B. Wang ◽  
D. Gao ◽  
I. Levchenko ◽  
K. Ostrikov ◽  
M. Keidar ◽  
...  
Keyword(s):  
Low Temperature ◽  
Boron Nitride ◽  
Chemical Vapour Deposition ◽  
Efficient Method ◽  
Vapour Deposition ◽  
Chemical Vapour ◽  
Self Organized ◽  
Reactive Gases ◽  
Hot Filament

A simple and efficient method for synthesizing complex graphene-inspired BNCO nanoflakes by plasma-enhanced hot filament chemical vapour deposition using B4C as a precursor and N2/H2 reactive gases is reported.

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