The Effect of Ar/H2 Plasma Pretreatments on Porous K=2.0 Dielectrics for Pore Sealing by Self-Assembled Monolayers Deposition

2012 ◽  
Vol 195 ◽  
pp. 146-149 ◽  
Author(s):  
Y. Sun ◽  
J. Swerts ◽  
P. Verdonck ◽  
A. Maheshwari ◽  
J.L. Prado ◽  
...  
Keyword(s):  
Plasma Temperature ◽  
Self Assembled Monolayers ◽  
Hydroxyl Groups ◽  
K Value ◽  
Oh Groups ◽  
Surface Hydroxyl ◽  
Pore Sealing ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Low K

Self-assembled monolayers (SAMs) deposition is being recently explored to help sealing the pores of a k=2.0 material. In order to enable a covalent chemical low-k surface functionalization by SAMs, a hydroxyl groups density as high as 1 to 2.5 OH groups/nm2 is required. This surface modification must be carefully controlled to confine the k below 10%. In this paper, the effects of plasma temperature, time and power on the SAMs deposition and plasma-induced damage are investigated. The main findings are that there is always a trade-off between surface hydroxyl groups density and bulk damage. A thick modified layer allows the SAM molecules to penetrate inside the pores which results in a decreased porosity and an increased k value with respect to correspondent plasma-treated pristine substrates.

Sealing of low-k dielectric (k=2.0) with self-assembled monolayers (SAMs) for the atomic layer deposition (ALD) of TiN

2013 ◽  
Vol 1559 ◽  
Author(s):  
Yiting Sun ◽  
Elisabeth Levrau ◽  
Michiel Blauw ◽  
Johan Meersschaut ◽  
Patrick Verdonck ◽  
...  
Keyword(s):  
Atomic Layer ◽  
Self Assembled Monolayers ◽  
Low Dielectric Constant ◽  
Hydroxyl Groups ◽  
Low Dielectric ◽  
Tin Film ◽  
Layer Deposition ◽  
Pore Sealing ◽  
Assembled Monolayers ◽  
Low K

ABSTRACTIn this work, a novel low dielectric constant (low-k) pore sealing approach was engineered by depositing firstly a sub-2 nm SAMs and then a 3 nm TiN barrier film. The low-k film was pretreated by plasma to introduce hydroxyl groups onto the surface, followed by SAMs deposition. Then a TiN film was deposited from tetrakis(dimethylamino)titanium (TDMAT) via ALD as a dielectric barrier. Penetration of Ti atoms into low-k was measured and used to evaluate the sealing ability of SAMs. For the samples covered with SAMs, around 90% reduction of Ti atoms penetration was achieved. The pore radius was reduced to below 0.5 nm after the barrier deposition. The ∆k after pretreatment and after SAMs are 0.1 and 0.16, respectively.

scholarly journals Self-Assembled Monolayers on Highly Porous Low-k Dielectrics by 3-Aminopropyltrimethoxysilane Treatment

Coatings ◽  
2019 ◽  
Vol 9 (4) ◽  
pp. 246
Author(s):  
Cheng ◽  
Haung ◽  
Lee ◽  
Chen ◽  
Fang
Keyword(s):  
Dielectric Constant ◽  
Dielectric Film ◽  
Dielectric Films ◽  
Breakdown Field ◽  
Self Assembled Monolayers ◽  
K Value ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Low K ◽  
Highly Porous

Highly porous low-dielectric-constant (low-k) dielectric materials with a dielectric constant (k) less than 2.50 are needed for 32 nm and beyond technological nodes. In this study, a highly porous low-k dielectric film with a k value of 2.25, open porosity of 32.0%, and pore diameter of 1.15 nm were treated by 3-Aminopropyltrimethoxysilane (APTMS) in wet solution in order to form self-assembled monolayers (SAMs) onto it. The effects of the formation SAMs on the electrical characteristics and reliability of highly porous low-k dielectric films were characterized. As SAMs were formed onto the highly porous low-k dielectric film by APTMS treatment, the dielectric breakdown field and the failure time were significantly improved, but at the expense of the increases in the dielectric constant and leakage current. Moreover, the formation SAMs enhanced the Cu barrier performance for highly porous low-k dielectric films. Therefore, the SAMs derived from APTMS treatment are promising for highly porous low-k dielectric films to ensure better integrity.

scholarly journals Influence of the nature of the alkanethiol terminal group on the electrochemical stability and blocking ability of self-assembled nanofilms on Au electrode

2021 ◽  
Vol 340 ◽  
pp. 01013
Author(s):  
Svetlana Ovchinnikova ◽  
Tatyana Aleksandrova
Keyword(s):  
Functional Group ◽  
Energy State ◽  
Terminal Group ◽  
Electrochemical Stability ◽  
Self Assembled Monolayers ◽  
Oh Groups ◽  
End Groups ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Terminal Functional Group

We studied the effect of the nature of the terminal group of thiols with the same chain length HS (CH2)8 – R (R: -CH3, -CH2OH, -NH2) on the electrodesorption behaviour of well-formed SAMs (the self-assembled monolayers), their stability and blocking ability using voltammetry and chronoamperometry. The nature of the terminal functional group determines the surface properties of SAM and provides the basis for subsequent interactions (for example, with peptides, proteins, DNA) in order to create sensors and bioagents. For the studied thiols, the hydrophilicity of the end groups increases in the series -CH3<< -NH2 ≤ -CH2OH; they also differ in polarity and the possibility of protonation of the amino group. For thiols with -CH3 and -CH2OH groups, an increase in the hydrophilicity of the terminal group leads to the formation of less stable and less ordered films. The replacement of carbon by nitrogen with approximately the same hydrophilicity of the groups (-CH2OH and -NH2) leads to the formation of a more stable film consisting of molecules in the same energy state, butwith poorer insulatingproperties.

scholarly journals Use of Self-Assembled Monolayers of Different Wettabilities To Study Surface Selection and Primary Adhesion Processes of Green Algal (Enteromorpha) Zoospores

2000 ◽  
Vol 66 (8) ◽  
pp. 3249-3254 ◽  
Author(s):  
Maureen E. Callow ◽  
J. A. Callow ◽  
Linnea K. Ista ◽  
Sarah E. Coleman ◽  
Aleece C. Nolasco ◽  
...  
Keyword(s):  
Contact Angle ◽  
Photoelectron Spectroscopy ◽  
Contact Angles ◽  
Self Assembled Monolayers ◽  
Use Of Self ◽  
Oh Groups ◽  
X Ray ◽  
Green Algal ◽  
Assembled Monolayers ◽  
Self Assembled

ABSTRACT We investigated surface selection and adhesion of motile zoospores of a green, macrofouling alga (Enteromorpha) to self-assembled monolayers (SAMs) having a range of wettabilities. The SAMs were formed from alkyl thiols terminated with methyl (CH3) or hydroxyl (OH) groups or mixtures of CH3- and OH-terminated alkyl thiols and were characterized by measuring the advancing contact angles and by X-ray photoelectron spectroscopy. There was a positive correlation between the number of spores that attached to the SAMs and increasing contact angle (hydrophobicity). Moreover, the sizes of the spore groups (adjacent spores touching) were larger on the hydrophobic SAMs. Video microscopy of a patterned arrangement of SAMs showed that more zoospores were engaged in swimming and “searching” above the hydrophobic sectors than above the hydrophilic sectors, suggesting that the cells were able to “sense” that the hydrophobic surfaces were more favorable for settlement. The results are discussed in relation to the attachment of microorganisms to substrata having different wettabilities.

Surface sealing using self-assembled monolayers and its effect on metal diffusion in porous low- k dielectrics studied using monoenergetic positron beams

2016 ◽  
Vol 368 ◽  
pp. 272-276 ◽  
Author(s):  
Akira Uedono ◽  
Silvia Armini ◽  
Yu Zhang ◽  
Takeaki Kakizaki ◽  
Reinhard Krause-Rehberg ◽  
...  
Keyword(s):  
Self Assembled Monolayers ◽  
Metal Diffusion ◽  
Surface Sealing ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Positron Beams ◽  
Low K

Characterization of Self Assembled Monolayers for Ultra Low-k Films

2005 ◽  
Author(s):  
B. Ramana Murthy ◽  
Wan Mun Yee ◽  
Ahila Krishnamoorthy ◽  
V. Anand ◽  
K.Y. Yong ◽  
...  
Keyword(s):  
Self Assembled Monolayers ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Low K

scholarly journals Unexpected Hydrophobicity on Self-Assembled Monolayers Terminated with Two Hydrophilic Hydroxyl Groups

Nanoscale ◽  
2021 ◽  
Author(s):  
Dangxin Mao ◽  
Xian Wang ◽  
Yuanyan Wu ◽  
Zonglin Gu ◽  
Chunlei Wang ◽  
...  
Keyword(s):  
Molecular Dynamics ◽  
Surface Roughness ◽  
Molecular Dynamics Simulations ◽  
Surface Hydrophobicity ◽  
Self Assembled Monolayers ◽  
Hydroxyl Groups ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Dynamics Simulations ◽  
First Time

Current major approaches to access surface hydrophobicity include directly introducing hydrophobic nonpolar groups/molecules into surface or elaborately fabricating surface roughness. Here, for the first time, molecular dynamics simulations show an...

Pore sealing of k 2.0 dielectrics assisted by self-assembled monolayers deposited from vapor phase

2014 ◽  
Vol 120 ◽  
pp. 240-245 ◽  
Author(s):  
Silvia Armini ◽  
Jana Loyo Prado ◽  
Mikhail Krishtab ◽  
Johan Swerts ◽  
Patrick Verdonck ◽  
...  
Keyword(s):  
Vapor Phase ◽  
Self Assembled Monolayers ◽  
Pore Sealing ◽  
Assembled Monolayers ◽  
Self Assembled

Pore Sealing of Porous Ultralow-k Dielectrics by Self-Assembled Monolayers Combined with Atomic Layer Deposition

2012 ◽  
Vol 1 (2) ◽  
pp. P42-P44 ◽  
Author(s):  
S. Armini ◽  
J. L. Prado ◽  
J. Swerts ◽  
Y. Sun ◽  
M. Krishtab ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Self Assembled Monolayers ◽  
Layer Deposition ◽  
Pore Sealing ◽  
Assembled Monolayers ◽  
Self Assembled
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