Wet-Chemical Etching of Ruthenium in Acidic Ce4+ Solution
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The wet-chemical etching of ruthenium in acidic solutions of cerium (IV) has been investigated using electrochemical methods. Etch rates were determined using Rutherford backscattering spectroscopy (RBS) and post-etching surface roughness was investigated using atomic force microscopy (AFM). Low-k material is compatible with the etchant, however, residues were formed.
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1998 ◽
Vol 133
(4)
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pp. 293-297
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2017 ◽
Vol 29
(3)
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pp. 201-208
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2018 ◽
Vol 343
◽
pp. 012006
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