The Electrical Characteristics of Chromium Oxide Film Produced by Son Beam Sputter Deposition

Journal of the Korean Institute of Electrical and Electronic Material Engineers ◽

10.4313/jkem.2002.15.6.518 ◽

2002 ◽

Vol 15 (6) ◽

pp. 518-523

Keyword(s):

Chromium Oxide ◽

Sputter Deposition ◽

Electrical Characteristics

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Electrical Characteristics of Thin Cerium Oxide Film on Silicon Substrate by Reactive DC Sputtering

Electrochemical and Solid-State Letters ◽

10.1149/1.1387225 ◽

2001 ◽

Vol 4 (9) ◽

pp. F15 ◽

Author(s):

Tung Ming Pan ◽

Chao Hsin Chien ◽

Tan Fu Lei ◽

Tien Sheng Chao ◽

Tiao Yuan Huang

Keyword(s):

Cerium Oxide ◽

Silicon Substrate ◽

Electrical Characteristics ◽

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Electrical characteristics of V2O5 thin films formed on p-Si by sputter-deposition and rapid thermal annealing

Applied Surface Science ◽

10.1016/j.apsusc.2004.10.100 ◽

2005 ◽

Vol 244 (1-4) ◽

pp. 444-448 ◽

Author(s):

M.H. Yoon ◽

Seongil Im

Keyword(s):

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Sputter Deposition ◽

Electrical Characteristics ◽

V2o5 Thin Films

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Ellipsometric Measurement on the Thickness of Hydrated Chromium Oxide Film of Tin Free Steel

Journal of the Japan Institute of Metals and Materials ◽

10.2320/jinstmet1952.33.11_1286 ◽

1969 ◽

Vol 33 (11) ◽

pp. 1286-1290 ◽

Author(s):

Hiromu Uchida ◽

Satoshi Kado ◽

Koji Yamada ◽

Chuichi Kato

Keyword(s):

Chromium Oxide ◽

Ellipsometric Measurement

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Depositing chromium oxide film on alumina ceramics enhances the surface flashover performance in vacuum via PECVD

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2020.126509 ◽

2021 ◽

Vol 405 ◽

pp. 126509

Author(s):

Weixin Yu ◽

Fei Kong ◽

Pan Dong ◽

Jiangong Zhang ◽

Ping Yan ◽

...

Keyword(s):

Chromium Oxide ◽

Alumina Ceramics ◽

Surface Flashover

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Improved adhesion of titanium oxide film to titanium-base alloy by Ti/O compositional gradient using reactive sputter-deposition

Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers ◽

10.1016/b978-044452224-5/50061-5 ◽

2006 ◽

pp. 383-388

Author(s):

Tsutomu Sonoda ◽

Akira Watazu ◽

Kiyotaka Katou ◽

Tadashi Asahina

Keyword(s):

Titanium Oxide ◽

Sputter Deposition ◽

Compositional Gradient ◽

Titanium Oxide Film ◽

Reactive Sputter Deposition

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Effects of Cu Metal Barrier on Electrical Characteristics of Porous Carbon-Doped Oxide Film

ECS Journal of Solid State Science and Technology ◽

10.1149/2162-8777/ac08da ◽

2021 ◽

Author(s):

Yi-Lung Cheng ◽

Chih-Yen Lee ◽

Giin-Shan Chen ◽

Jau-Shiung Fang

Keyword(s):

Porous Carbon ◽

Electrical Characteristics ◽

Carbon Doped ◽

Metal Barrier ◽

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Chromium oxide film thickness measurements using spontaneous Raman scattering

Journal of Raman Spectroscopy ◽

10.1002/jrs.1250150305 ◽

1984 ◽

Vol 15 (3) ◽

pp. 156-159 ◽

Author(s):

W. A. England ◽

S. N. Jenny ◽

D. A. Greenhalgh

Keyword(s):

Raman Scattering ◽

Film Thickness ◽

Chromium Oxide ◽

Spontaneous Raman Scattering ◽

Oxide Film Thickness ◽

Thickness Measurements

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Chemical State Analysis of Hydrated Chromium Oxide Film on Tin Free Steel Using Fourier Transform Infra-red Spectrometry

Tetsu-to-Hagane ◽

10.2355/tetsutohagane1955.77.11_2000 ◽

1991 ◽

Vol 77 (11) ◽

pp. 2000-2006 ◽

Author(s):

Takako YAMASHITA ◽

Akira YAMAMOTO ◽

Kozo TSUNOYAMA

Keyword(s):

Fourier Transform ◽

Chromium Oxide ◽

Chemical State ◽

Infra Red ◽

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Nanogap Formation Using a Chromium Oxide Film and Its Application as a Palladium Hydrogen Switch

Langmuir ◽

10.1021/acs.langmuir.1c02643 ◽

2022 ◽

Author(s):

Minkyu Cho ◽

Taehwan Kim ◽

Incheol Cho ◽

Min Gao ◽

Kyungnam Kang ◽

...

Keyword(s):

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Analysis of hydrated chromium oxide film of tin free steel(TFS) by microscopic ellipsometry.

Journal of the Metal Finishing Society of Japan ◽

10.4139/sfj1950.39.452 ◽

1988 ◽

Vol 39 (8) ◽

pp. 452-457 ◽

Author(s):

Masahiro YAMAMOTO ◽

Tsunetoshi ASAI ◽

Shigeyoshi MAEDA

Keyword(s):

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