scholarly journals Atmospheric degradation of 3-methylfuran: kinetic and products study

2011 ◽  
Vol 11 (7) ◽  
pp. 3227-3241 ◽  
Author(s):  
A. Tapia ◽  
F. Villanueva ◽  
M. S. Salgado ◽  
B. Cabañas ◽  
E. Martínez ◽  
...  

Abstract. A study of the kinetics and products obtained from the reactions of 3-methylfuran with the main atmospheric oxidants has been performed. The rate coefficients for the gas-phase reaction of 3-methylfuran with OH and NO3 radicals have been determined at room temperature and atmospheric pressure (air and N2 as bath gases), using a relative method with different experimental techniques. The rate coefficients obtained for these reactions were (in units cm3 molecule−1 s−1) kOH = (1.13 ± 0.22) × 10−10 and kNO3 = (1.26 ± 0.18) × 10−11. Products from the reaction of 3-methylfuran with OH, NO3 and Cl atoms in the absence and in the presence of NO have also been determined. The main reaction products obtained were chlorinated methylfuranones and hydroxy-methylfuranones in the reaction of 3-methylfuran with Cl atoms, 2-methylbutenedial, 3-methyl-2,5-furanodione and hydroxy-methylfuranones in the reaction of 3-methylfuran with OH and NO3 radicals and also nitrated compounds in the reaction with NO3 radicals. The results indicate that, in all cases, the main reaction path is the addition to the double bond of the aromatic ring followed by ring opening in the case of OH and NO3 radicals. The formation of 3-furaldehyde and hydroxy-methylfuranones (in the reactions of 3-methylfuran with Cl atoms and NO3 radicals) confirmed the H-atom abstraction from the methyl group and from the aromatic ring, respectively. This study represents the first product determination for Cl atoms and NO3 radicals in reactions with 3-methylfuran. The reaction mechanisms and atmospheric implications of the reactions under consideration are also discussed.

2010 ◽  
Vol 10 (10) ◽  
pp. 22905-22952
Author(s):  
A. Tapia ◽  
F. Villanueva ◽  
M. S. Salgado ◽  
B. Cabañas ◽  
E. Martínez ◽  
...  

Abstract. A study of the kinetics and products obtained from the reactions of 3-methylfuran with the main atmospheric oxidants has been performed. The rate coefficients for the gas-phase reaction of 3-methylfuran with OH and NO3 radicals have been determined at room temperature and atmospheric pressure (air and N2 as bath gases), using a relative method with different experimental techniques. The absolute rate coefficients obtained for these reactions were (in units cm3 molecule−1 s−1): kOH=(1.13±0.22)×10−10 and kNO3=(1.26±0.18)×10−11. These rate coefficients have been compared with those available in the literature. The products from the reaction of 3-methylfuran with OH, NO3 and Cl atoms in the absence and in the presence of NOx species have also been determined. The main reaction products obtained were chlorinated methylfuranones and hydroxy-methylfuranones for the reaction of 3-methylfuran with Cl atoms, 2-methylbutenedial, 3-methyl-2,5-furanodione and hydroxy-methylfuranones for the reaction of 3-methylfuran with OH and NO3 radicals and also nitrated compounds for the reaction with NO3 radicals. The results indicate that in all cases the main reaction path is the addition to the double bond of the aromatic ring followed by ring opening in the case of OH and NO3 radicals. The formation of 3-furaldehyde and hydroxy-methylfuranones (in the reactions of 3-methylfuran with Cl atoms and NO3 radicals) confirmed the H-atom abstraction from the methyl group and from the aromatic ring, respectively. This study represents the first product determination for both Cl atoms and the NO3 radical in reactions with 3-methylfuran. The reaction mechanisms and atmospheric implications of the reactions under consideration are also discussed.


Author(s):  
Cynthia Rivela ◽  
Alejandro L. Cardona ◽  
Maria B Blanco ◽  
Ian Barnes ◽  
Martina Kieninger ◽  
...  

The gas-phase reaction products of 2-fluoropropene (2FP) with Cl atoms has been determined for the first time at 298 K and atmospheric pressure using a 1080 L quartz-glass photoreactor coupled...


2016 ◽  
Vol 119 (1) ◽  
pp. 5-18
Author(s):  
Ádám Illés ◽  
Mária Farkas ◽  
Gábor László Zügner ◽  
Gyula Novodárszki ◽  
Magdolna Mihályi ◽  
...  

1993 ◽  
Vol 48 (12) ◽  
pp. 1234-1238 ◽  
Author(s):  
J. Nolte ◽  
J. Grußdorf ◽  
F. Temps ◽  
H. Gg. Wagner

Using the discharge flow method, the kinetics of the gas phase reactionHOCO + O2 products (1)was investigated at room temperature and pressures around p ≈ 2.0 mbar with Far Infrared LaserMagnetic Resonance (FIR-LMR) detection of HOCO, HO2 , and OH. From the measured concentration-versus-time decay profiles of HOCO in the absence and presence of a large excess of O2 , theoverall rate constant of the reaction was found to bek1 (296 K) = (9.9 ±1.5) • 1011 cm3/mol • s.The main reaction channel, which leads to production of HO2 + CO2 , could be established.


RSC Advances ◽  
2019 ◽  
Vol 9 (39) ◽  
pp. 22618-22626
Author(s):  
Alejandro L. Cardona ◽  
Rodrigo G. Gibilisco ◽  
María B. Blanco ◽  
Peter Wiesen ◽  
Mariano Teruel

Relative rate coefficients and product distribution of the reaction of 2-butanethiol (2butSH) with OH radicals and Cl atoms were obtained at atmospheric pressure and 298 K.


2003 ◽  
Vol 81 (12) ◽  
pp. 1477-1481 ◽  
Author(s):  
Olga S Herrera ◽  
Jorge D Nieto ◽  
Silvia I Lane ◽  
Elena V Oexler

The reaction of CF3 radicals, generated by photolysis of CF3I or hexafluoroacetone with thiophene, was studied in the gas phase at 25 °C. At conversion of thiophene less than 20%, monosubstituted CF3-thiophenes were found as the main reaction products, in addition to CF3H, C2F6, and monosubstituted dihydro-CF3-thiophene, the latter in very low proportion. An isomeric mixture of 2- and 3-CF3-thiophene was obtained in a ratio of about 16, independent of the radical source used (CF3I or hexafluoroacetone) to produce the CF3 radicals. A plausible mechanism that accounts for the observed products is proposed, and the reactivity of thiophene toward the CF3 radical at 25 °C was determined as kadd/kc1/2 = 106 ± 4 cm3/2 mol–1/2 s–1/2.Key words: thiophene, trifluoromethyl radical, reaction mechanism, reactivity.


1988 ◽  
Vol 20 (11) ◽  
pp. 867-875 ◽  
Author(s):  
Timothy J. Wallington ◽  
Loretta M. Skewes ◽  
Walter O. Siegl ◽  
Ching-Hsong Wu ◽  
Steven M. Japar

2001 ◽  
Vol 15 (1) ◽  
pp. 44-51 ◽  
Author(s):  
Tetsuya Takemoto ◽  
Kenji Tabata ◽  
Yonghong Teng ◽  
Shuiliang Yao ◽  
Akira Nakayama ◽  
...  

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