scholarly journals Development of Spin-Contrast-Variation Neutron Reflectometry for Structural Analyses of Multilayer Films

hamon ◽  
2020 ◽  
Vol 30 (4) ◽  
pp. 207-211
Author(s):  
Takayuki Kumada ◽  
Daisuke Miura ◽  
Kazuhiro Akutsu ◽  
Jun-ichi Suzuki ◽  
Naoya Torikai
Keyword(s):  
Multilayer Films ◽  
Neutron Reflectometry ◽  
Contrast Variation

scholarly journals Development of spin-contrast-variation neutron reflectometry for the structural analysis of multilayer films

2019 ◽  
Vol 52 (5) ◽  
pp. 1054-1060
Author(s):  
Takayuki Kumada ◽  
Kazuhiro Akutsu ◽  
Kazuki Ohishi ◽  
Toshiaki Morikawa ◽  
Yukihiko Kawamura ◽  
...  
Keyword(s):  
Structural Analysis ◽  
Scattering Length ◽  
Structural Parameters ◽  
Multilayer Films ◽  
Neutron Reflectometry ◽  
Surface Model ◽  
Neutron Reflectivity ◽  
Contrast Variation ◽  
Surfaces And Interfaces ◽  
Free Surface Model

The spin-contrast-variation neutron reflectometry technique was developed for the structural analysis of multilayer films. Polarized-neutron reflectivity curves of film samples vary as a function of their proton polarization (P H). The P H-dependent reflectivity curves of a polystyrene monolayer film were precisely reproduced using a common set of structural parameters and the P H-dependent neutron scattering length density of polystyrene. This result ensures that these curves are not deformed by inhomogeneous P H but can be used for structural analysis. Unpolarized reflectivity curves of poly(styrene-block-isoprene) films were reproduced using a flat free-surface model but P H-dependent polarized reflectivity curves were not. The global fit of the P H-dependent multiple reflectivity curves revealed that holes with a depth corresponding to one period of the periodic lamellae of microphase-separated polystyrene and polyisoprene domains were produced on the surface of the films, which agrees with the microscopic results. In this manner, the spin-contrast-variation neutron reflectometry technique determines the structure of multiple surfaces and interfaces in a film sample while excluding the incorrect structure that accidentally accounts for a single unpolarized reflectivity curve only.

Probing the Interface Structure of Adhering Cells by Contrast Variation Neutron Reflectometry

Langmuir ◽  
2018 ◽  
Vol 35 (2) ◽  
pp. 513-521 ◽  
Author(s):  
Philip Böhm ◽  
Alexandros Koutsioubas ◽  
Jean-François Moulin ◽  
Joachim O. Rädler ◽  
Erich Sackmann ◽  
...  
Keyword(s):  
Interface Structure ◽  
Neutron Reflectometry ◽  
Contrast Variation

scholarly journals Neutron reflectivity for soft matter

2018 ◽  
Vol 188 ◽  
pp. 04001 ◽  
Author(s):  
Fabrice Cousin ◽  
Alexis Chennevière
Keyword(s):  
Soft Matter ◽  
Scattering Length ◽  
Low Energy ◽  
Neutron Reflectometry ◽  
Neutron Reflectivity ◽  
Isotopic Substitution ◽  
Contrast Variation ◽  
Entire Surface ◽  
Polymeric Systems ◽  
Scattering Technique

Specular neutron reflectivity is a technique enabling the measurement of coherent neutron scattering length density profile perpendicular to the plane of a surface or interface, and thereby the profile of chemical composition. The characteristic sizes that are probed range from around 5Å up 5000 Å. It is a scattering technique that averages information over the entire surface and it is therefore not possible to obtain information on correlations in the plane of the interface. The specific properties of neutrons (possibility of tuning the contrast by isotopic substitution, negligible absorption, low energy of the incident neutrons) makes it particularly interesting in the fields of soft matter and biophysics. This course is composed of three parts describing respectively its principle, the experimental aspects (diffractometers, samples), and some scientific examples of neutron reflectometry focusing on the use of contrast variation to probe polymeric systems.

Detailed Structure of Molecularly Thin Polyelectrolyte Multilayer Films on Solid Substrates as Revealed by Neutron Reflectometry

1998 ◽  
Vol 31 (25) ◽  
pp. 8893-8906 ◽  
Author(s):  
Mathias Lösche ◽  
Johannes Schmitt ◽  
Gero Decher ◽  
Wim G. Bouwman ◽  
Kristian Kjaer
Keyword(s):  
Multilayer Films ◽  
Neutron Reflectometry ◽  
Detailed Structure ◽  
Polyelectrolyte Multilayer ◽  
Solid Substrates

Fabrication and characterization - by High Resolution Electron Microscopy and atom probe microanalysis - of Co-based metallic multilayer films

1990 ◽  
Vol 48 (4) ◽  
pp. 772-773
Author(s):  
Amanda K. Petford-Long ◽  
A. Cerezo ◽  
M.G. Hetherington
Keyword(s):  
Electron Microscopy ◽  
High Resolution ◽  
High Resolution Electron Microscopy ◽  
Atom Probe ◽  
Multilayer Films ◽  
Interface Roughness ◽  
Probe Field ◽  
Resolution Electron ◽  
Potential Applications ◽  
Field Ion Microscope

The fabrication of multilayer films (MLF) with layer thicknesses down to one monolayer has led to the development of materials with unique properties not found in bulk materials. The properties of interest depend critically on the structure and composition of the films, with the interfacial regions between the layers being of particular importance. There are a number of magnetic MLF systems based on Co, several of which have potential applications as perpendicular magnetic (e.g Co/Cr) or magneto-optic (e.g. Co/Pt) recording media. Of particular concern are the effects of parameters such as crystallographic texture and interface roughness, which are determined by the fabrication conditions, on magnetic properties and structure.In this study we have fabricated Co-based MLF by UHV thermal evaporation in the prechamber of an atom probe field-ion microscope (AP). The multilayers were deposited simultaneously onto cobalt field-ion specimens (for AP and position-sensitive atom probe (POSAP) microanalysis without exposure to atmosphere) and onto the flat (001) surface of oxidised silicon wafers (for subsequent study in cross-section using high-resolution electron microscopy (HREM) in a JEOL 4000EX. Deposi-tion was from W filaments loaded with material in the form of wire (Co, Fe, Ni, Pt and Au) or flakes (Cr). The base pressure in the chamber was around 8×10−8 torr during deposition with a typical deposition rate of 0.05 - 0.2nm/s.

Electrostatic Adhesion Testing for the Evaluation of Metallization Adhesion

1997 ◽  
Vol 473 ◽  
Author(s):  
H. S. Yang ◽  
F. R. Brotzen ◽  
D. L. Callahan ◽  
C. F. Dunn
Keyword(s):  
Thin Film ◽  
Electron Microscopy ◽  
Scanning Electron Microscopy ◽  
Distribution Function ◽  
Quantitative Measurement ◽  
Multilayer Films ◽  
Adhesion Testing ◽  
Novel Technique ◽  
Electrostatic Adhesion ◽  
Scanning Electron

ABSTRACTQuantitative measurement of the adhesion strength of thin film metallizations has been achieved by a novel technique employing electrostatic forces to generate delaminating stresses. This technique has been used in testing the adhesion of Al-Cu, Cu, and Al multilayer films deposited on Si. Micro-blister-type failure is revealed by scanning electron microscopy. The delamination process and the geometry of the blister are discussed. The measured adhesion data fit a Weibull distribution function.

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