Characterization of InAlN/GaN high-electron-mobility transistors grown on Si substrate using graded layer and strain-layer superlattice

2014 ◽  
Vol 7 (4) ◽  
pp. 041002 ◽  
Author(s):  
Arata Watanabe ◽  
Joseph J. Freedsman ◽  
Ryuhei Oda ◽  
Tatsuya Ito ◽  
Takashi Egawa
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