Impact of Dynamic Stress on Reliability of Nanoscale n-Channel Metal–Oxide–Semiconductor Field-Effect Transistors with SiON Gate Dielectric Operating in a Complementary Metal–Oxide–Semiconductor Inverter at Elevated Temperature
2011 ◽
2009 ◽
Vol 48
(4)
◽
pp. 04C051
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Keyword(s):
2001 ◽
pp. 1343-1350