Effects of post exposure bake temperature and exposure time on SU-8 nanopattern obtained by electron beam lithography
2014 ◽
Vol 53
(11S)
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pp. 11RF03
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Keyword(s):
2009 ◽
Vol 9
(1)
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pp. 562-566
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Keyword(s):
2008 ◽
Vol 26
(6)
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pp. 2390-2393
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2015 ◽
Vol 54
(9)
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pp. 096703
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1983 ◽
Vol 41
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pp. 96-99