Dependence of absolute photon flux on infrared absorbance alteration and surface roughness on photoresist polymers irradiated with vacuum ultraviolet photons emitted from HBr plasma

2017 ◽  
Vol 56 (12) ◽  
pp. 126503 ◽  
Author(s):  
Yan Zhang ◽  
Takuya Takeuchi ◽  
Kenji Ishikawa ◽  
Toshio Hayashi ◽  
Keigo Takeda ◽  
...  
Keyword(s):  
Surface Roughness ◽  
Vacuum Ultraviolet ◽  
Photon Flux ◽  
Ultraviolet Photons ◽  
Hbr Plasma

Low Temperature OMVPE of ZnSe from Alkyl Sources Using a Plasma Disk Lamp

1988 ◽  
Vol 129 ◽  
Author(s):  
K. L. Tokuda ◽  
B. Pihlstrom ◽  
D. W. Kisker ◽  
M. Lamont Schnoes ◽  
G. J. Collins
Keyword(s):  
Growth Process ◽  
Vacuum Ultraviolet ◽  
Source Material ◽  
Organometallic Vapor Phase Epitaxy ◽  
Impurity Incorporation ◽  
High Quality ◽  
Selenium Compound ◽  
Ultraviolet Photons ◽  
Reduced Toxicity ◽  
Source Materials

ABSTRACTThe growth of high quality ZnSe by organometallic vapor phase epitaxy (OMVPE) has generally been hindered because of parasitic source pre-reactions or relatively high source decomposition temperatures. In this work, we have used vacuum ultraviolet photons generated by a disk-plasma lamp to assist the ZnSe growth process using diethylselenium and diethylzinc as source materials. This approach has resulted in satisfactory growth rates and high material quality at temperatures as low as 250°C, without the limitations of prereaction typically observed when H2Se is used for the selenium source material. In addition, the alkyl selenium compound offers advantages due to reduced toxicity compared to H2Se. This new, low-growth-temperature process thus offers the possibility of improved stoichiometry and impurity incorporation control as well as a reduced thermal effect on the underlying substrate during growth. At the same time, the advantages of excellent morphology and uniformity typically exhibited by the alkylbased growth processes are retained.

Low temperature shallow junction formation using vacuum ultraviolet photons during rapid thermal processing

1997 ◽  
Vol 70 (13) ◽  
pp. 1700-1702 ◽  
Author(s):  
R. Singh ◽  
K. C. Cherukuri ◽  
L. Vedula ◽  
A. Rohatgi ◽  
S. Narayanan
Keyword(s):  
Low Temperature ◽  
Thermal Processing ◽  
Vacuum Ultraviolet ◽  
Rapid Thermal Processing ◽  
Shallow Junction ◽  
Junction Formation ◽  
Ultraviolet Photons

Cleaning of carbon contaminated vacuum ultraviolet‐optics: Influence on surface roughness and reflectivity

1992 ◽  
Vol 63 (1) ◽  
pp. 1428-1431 ◽  
Author(s):  
B. R. Müller ◽  
J. Feldhaus ◽  
F. Schäfers ◽  
F. Eggenstein
Keyword(s):  
Surface Roughness ◽  
Vacuum Ultraviolet

Metallic Na formation in/on NaCl crystals with irradiation by electron or vacuum ultraviolet photons

1997 ◽  
Vol 49 (6) ◽  
pp. 609-615 ◽  
Author(s):  
Shigehiro Owaki ◽  
Shigeko Koyama ◽  
Masao Takahashi ◽  
Masao Kamada ◽  
Ryouichi Suzuki
Keyword(s):  
Vacuum Ultraviolet ◽  
Ultraviolet Photons

High Photon Flux Beamline 4B8 for Vacuum Ultraviolet Spectroscopy at BSRF

2007 ◽  
Author(s):  
Ye Tao ◽  
Yan Huang ◽  
Haijie Qian ◽  
Yongnian Yan ◽  
Jianhua Xu ◽  
...  
Keyword(s):  
Vacuum Ultraviolet ◽  
Photon Flux ◽  
Ultraviolet Spectroscopy ◽  
High Photon Flux ◽  
Vacuum Ultraviolet Spectroscopy

Delivering high-purity vacuum ultraviolet photons at the Brazilian toroidal grating monochromator (TGM) beamline

2007 ◽  
Vol 156-158 ◽  
pp. 168-171 ◽  
Author(s):  
R.L. Cavasso Filho ◽  
A.F. Lago ◽  
M.G.P. Homem ◽  
S. Pilling ◽  
A. Naves de Brito
Keyword(s):  
High Purity ◽  
Vacuum Ultraviolet ◽  
Grating Monochromator ◽  
Ultraviolet Photons
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