Fabrication Low-voltage Amorphous Indium Zinc Oxide(a-IZO) Thin Film Transistors using High Dielectric HfO2 as Gate Insulator at Room Tempature
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2011 ◽
Vol 14
(11)
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pp. H442
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2016 ◽
Vol 81
(2)
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pp. 570-575
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2007 ◽
Vol 51
(6)
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pp. 1999
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2012 ◽
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