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High-k Thin Films by Atomic Layer Deposition for Energy and Information Storage
Journal of the Korean Society for Precision Engineering
◽
10.7736/kspe.2018.35.12.1131
◽
2018
◽
Vol 35
(12)
◽
pp. 1131-1136
Author(s):
Jihwan An
Keyword(s):
Thin Films
◽
Atomic Layer Deposition
◽
Atomic Layer
◽
Information Storage
◽
Layer Deposition
◽
High K
Download Full-text
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◽
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◽
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◽
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Liquid Injection Atomic Layer Deposition of Metallic Ru Thin Films from Ru(tmhd)3 and of High-k TiO2 Thin Films from Ti(O-i-Pr)2(tmhd)2
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◽
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◽
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◽
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◽
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A Comparison of O3 and H2O as Oxygen Sources for Atomic Layer Deposition Processing of HfAlOx Thin Films for High-k Dielectric Nanocapacitor Applications
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◽
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◽
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Structural and electrical properties of Ge-doped ZrO2 thin films grown by atomic layer deposition for high-k dielectrics
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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◽
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