A Microvalve Module with High Chemical Inertness and Embedded Flow Heating for Microscale Gas Chromatography

This paper reports a multi-valve module with high chemical inertness and embedded flow heating for microscale gas chromatography (µGC) systems. The multi-valve module incorporates a monolithically microfabricated die stack, polyimide valve membranes, and solenoid actuators. The design incorporates three valves within a single module of volume 30.2 cm3, which is suitable for the small form factor of µGC systems. The die stack uses fused silica wafers and polyimide valve membranes that enhance chemical inertness. The monolithic die stack requires only three lithographic masks to pattern fluidic microchannels, valve seats, and thin-film metal heaters and thermistors. The performance of fabricated multi-valve modules is compared to a commercial valve in tests using multiple volatile organic compounds, including alkanes, alcohols, ketones, aromatic hydrocarbons, and phosphonates. The valves show almost no distortion of chromatographic peaks. The experimentally measured ratio of flow conductance is 3.46 × 103, with 4.15 sccm/kPa in the open state and 0.0012 sccm/kPa in the closed state. The response time is <120 ms.

Graphene Membrane as Suspended Mask for Lithography

Thanks to its excellent mechanical properties, graphene is particularly suited for the realization of suspended membranes. The present paper deals with one possible application of such membranes that is the realization of suspended lithographic masks for shadow evaporation onto a substrate. This technique, which is largely used for realizing mesoscopic devices, where the quality requirements for the junctions prevent the exposure to ambient air and the occurrence of quantum phenomena requires highly defined structures, can be improved by the use of pure 2-dimensional masks, like graphene ones. Advantages and differences of this material with respect to commonly employed polymers are presented and discussed.

Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography

The reflection and diffraction of extreme ultraviolet (EUV) light from lithographic masks and the projection imaging of these masks by all-reflective systems introduce several significant imaging artifacts. The off-axis illumination of the mask causes asymmetric shadowing, a size bias between features with different orientations and telecentricity errors. The image contrast varies with the feature orientation and can easily drop far below intuitively expected values. The deformation of the wavefront or phase of the incident light by thick absorbers generates aberration-like effects, especially variations of the best-focus (BF) position vs. the pitch and size of the imaged patterns. Partial reflection of light from the top of the absorber generates a weak secondary image, which superposes with the main image. Based on a discussion of the root causes of these phenomena, we employ mask diffraction and imaging analysis for a quantitative analysis of these effects for standard EUV masks. Simulations for various non-standard types of mask stacks (e.g. etched multilayers, buried shifters, etc.) and for various non-standard absorber materials are used to explore the imaging capabilities of alternative masks for EUV lithography. Finally, an outlook at anamorphic systems for larger numerical apertures is given.

Direct ink writing of special-shaped structures based on TiO2 inks

Direct ink writing (DIW) method is a novel kind of ceramic fabrication approach which allows one to design and rapidly construct ceramic products in complex shapes without the need for any lithographic masks, dies or expensive moulds. A 40 wt.% water-based titanium dioxide (TiO2) suspension was formulated. With the help of DIW technique, two-dimensional (2D) spiral structures, three-dimensional (3D) woodpile structures, cylindrical structures and half conical structures at micrometer scale were fabricated. According to the rheological test, the ink shows a shear-thinning behavior and appropriate viscoelastic properties, which ensures a feasible shaping process. The scanning electron microscopy (SEM) test shows that the samples sintered at 1050[Formula: see text]C for 2 h have formed ceramics completely. The DIW method has merits to pattern ceramics into special-shaped structures into two and three dimensions with high precision and good designability, which provides new ideas and methods for structural, functional and biomedical applications.

Dynamics of dislocations in a two-dimensional block copolymer system with hexagonal symmetry

Block copolymer thin films have attracted considerable attention for their ability to self-assemble into nanometre-scale architectures. Recent advances in the use of block copolymer thin films as nano-lithographic masks have driven research efforts in order to have better control of long-range ordering in the plane of the film. Irrespective of the method of sample preparation, different quasi-two-dimensional systems with hexagonal symmetry unavoidably contain translational defects, called dislocations. Dislocations control the process of coarsening in the nano/meso-scales and provide one of the most important mechanisms of length-scale selection in hexagonal patterns. Although in the last decade the nonlinear dynamics of topological defects in quasi-two-dimensional systems has witnessed significant progress, still little is known about the role of external fields on the creation and annihilation mechanisms involved in the relaxation process towards equilibrium states. In this paper, the dynamics of dislocations in non-optimal hexagonal patterns is studied in the framework of the Ohta–Kawasaki model for a diblock copolymer. Measurements of the climb and glide velocities as a function of the wave vector deformation reveal the main mechanisms of relaxation associated with the motion of dislocations.