The Carnegie Supernova Project I

We aim to improve upon contemporary methods to estimate host-galaxy reddening of stripped-envelope (SE) supernovae (SNe). To this end the Carnegie Supernova Project (CSP-I) SE SN photometry data release, consisting of nearly three dozen objects, is used to identify a minimally reddened sub-sample for each traditionally defined spectroscopic sub-type (i.e., SNe IIb, SNe Ib, SNe Ic). Inspection of the optical and near-infrared (NIR) colors and color evolution of the minimally reddened sub-samples reveals a high degree of homogeneity, particularly between 0 d to +20 d relative to B-band maximum. This motivated the construction of intrinsic color-curve templates, which when compared to the colors of reddened SE SNe, yields an entire suite of optical and NIR color excess measurements. Comparison of optical/optical vs. optical/NIR color excess measurements indicates the majority of the CSP-I SE SNe suffer relatively low amounts of reddening (i.e., E(B−V)host< 0.20 mag) and we find evidence for different RVhost values among different SE SN. Fitting the color excess measurements of the seven most reddened (i.e., E(B−V)host> 0.20 mag) objects with the Fitzpatrick (1999, PASP, 111, 63) reddening law model provides robust estimates of the host visual-extinction AVhost and RVhost. In the case of the SE SNe with relatively low amounts of reddening, a preferred value of RVhost is adopted for each sub-type, resulting in estimates of AVhost through Fitzpatrick (1999) reddening law model fits to the observed color excess measurements. Our analysis suggests SE SNe reside in galaxies characterized by a range of dust properties. We also find evidence that SNe Ic are more likely to occur in regions characterized by larger RVhost values compared to SNe IIb/Ib and they also tend to suffer more extinction. The later finding is consistent with work in the literature suggesting SNe Ic tend to occur in regions of on-going star formation.

FAST SEARCH ALGORITHMS FOR INDUSTRIAL INSPECTION

This paper presents an efficient general purpose search algorithm for alignment and an applied procedure for IC print mark quality inspection. The search algorithm is based on normalized cross-correlation and enhances it with a hierarchical resolution pyramid, dynamic programming, and pixel over-sampling to achieve subpixel accuracy on one or more targets. The general purpose search procedure is robust with respect to linear change of image intensity and thus can be applied to general industrial visual inspection. Accuracy, speed, reliability, and repeatability are all critical for the industrial use. After proper optimization, the proposed procedure was tested on the IC inspection platforms in the Mechanical Industry Research Laboratories (MIRL), Industrial Technology Research Institute (ITRI), Taiwan. The proposed method meets all these criteria and has worked well in field tests on various IC products.