Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium

The use of short cycle test chips to accelerate yield learning during the start up of a 150 mm fabrication facility

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148139 ◽

2002 ◽

Author(s):

J. McDaniel ◽

D. Moursund ◽

C. Silsby ◽

J. Winnett

Keyword(s):

Short Cycle ◽

Start Up ◽

Yield Learning ◽

Test Chips

Download Full-text

Multi-chip modules: a comparative study-phase I: system design and substrate selection

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148156 ◽

2002 ◽

Cited By ~ 1

Author(s):

R.C. Bracken ◽

M.M. Salatino ◽

C.L. Adkins ◽

B.P. Kraemer

Keyword(s):

Comparative Study ◽

Phase I ◽

System Design ◽

Study Phase ◽

Substrate Selection

Download Full-text

Schottky barrier enhancement in Ni/Al layer-by-layer contacts to n-GaAs

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148153 ◽

2002 ◽

Author(s):

A.K. Kulkarni ◽

J. Lu

Keyword(s):

Schottky Barrier ◽

Layer By Layer

Download Full-text

An ion-implanted N-well bipolar process for university analog integrated circuit fabrication

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148121 ◽

2002 ◽

Author(s):

A.R. La Pietra ◽

L. Fuller

Keyword(s):

Integrated Circuit ◽

Analog Integrated Circuit ◽

Integrated Circuit Fabrication ◽

Circuit Fabrication ◽

Ion Implanted

Download Full-text

Electrical characterization of MOSIS-fabricated circuit elements

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148131 ◽

2002 ◽

Author(s):

C.M. Stillo ◽

R.M. Fox ◽

D.S. Langford ◽

D.J. Ferris

Keyword(s):

Electrical Characterization ◽

Circuit Elements

Download Full-text

Capacitance-voltage characteristics of amorphous silicon based metal-insulator-semiconductor structure

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148130 ◽

2002 ◽

Author(s):

J.S. Choi ◽

G.W. Neudeck

Keyword(s):

Amorphous Silicon ◽

Semiconductor Structure ◽

Metal Insulator ◽

Metal Insulator Semiconductor ◽

Capacitance Voltage ◽

Silicon Based

Download Full-text

The microelectronics manufacturing engineering program at Rensselaer Polytechnic Institute

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148118 ◽

2002 ◽

Cited By ~ 1

Author(s):

J.B. Hudson ◽

R.J. Gutmann

Keyword(s):

Rensselaer Polytechnic Institute ◽

Polytechnic Institute ◽

Engineering Program ◽

Manufacturing Engineering

Download Full-text

A joint industry-university CIM project for university microelectronics manufacturing

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148117 ◽

2002 ◽

Cited By ~ 8

Author(s):

L.F. Fuller ◽

C. Karacal ◽

T.J. VanDenbosch ◽

S. Slagsvol ◽

M. Poponiak

Download Full-text

Concurrent use of two-dimensional process and device simulators in the development of a latch-up free BiCMOS process

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148142 ◽

2002 ◽

Author(s):

M.G. Guvench ◽

S. Irving ◽

M. Robinson ◽

D. Desbiens

Keyword(s):

Two Dimensional ◽

Concurrent Use ◽

Bicmos Process ◽

Latch Up

Download Full-text

Low dielectric constant interconnect technology-a paradigm for interdisciplinary industry-university programs

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium ◽

10.1109/ugim.1991.148116 ◽

2002 ◽

Author(s):

R.J. Gutmann ◽

R. Isaac

Keyword(s):

Dielectric Constant ◽

Low Dielectric Constant ◽

Low Dielectric ◽

University Programs ◽

Interconnect Technology

Download Full-text

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium
Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

The use of short cycle test chips to accelerate yield learning during the start up of a 150 mm fabrication facility

Multi-chip modules: a comparative study-phase I: system design and substrate selection

Schottky barrier enhancement in Ni/Al layer-by-layer contacts to n-GaAs

An ion-implanted N-well bipolar process for university analog integrated circuit fabrication

Electrical characterization of MOSIS-fabricated circuit elements

Capacitance-voltage characteristics of amorphous silicon based metal-insulator-semiconductor structure

The microelectronics manufacturing engineering program at Rensselaer Polytechnic Institute

A joint industry-university CIM project for university microelectronics manufacturing

Concurrent use of two-dimensional process and device simulators in the development of a latch-up free BiCMOS process

Low dielectric constant interconnect technology-a paradigm for interdisciplinary industry-university programs

Export Citation Format

Proceedings Ninth Biennial University/Government/Industry Microelectronics SymposiumLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

The use of short cycle test chips to accelerate yield learning during the start up of a 150 mm fabrication facility

Multi-chip modules: a comparative study-phase I: system design and substrate selection

Schottky barrier enhancement in Ni/Al layer-by-layer contacts to n-GaAs

An ion-implanted N-well bipolar process for university analog integrated circuit fabrication

Electrical characterization of MOSIS-fabricated circuit elements

Capacitance-voltage characteristics of amorphous silicon based metal-insulator-semiconductor structure

The microelectronics manufacturing engineering program at Rensselaer Polytechnic Institute

A joint industry-university CIM project for university microelectronics manufacturing

Concurrent use of two-dimensional process and device simulators in the development of a latch-up free BiCMOS process

Low dielectric constant interconnect technology-a paradigm for interdisciplinary industry-university programs

Proceedings Ninth Biennial University/Government/Industry Microelectronics Symposium
Latest Publications