High-Rate Deposition of Amorphous Silicon Thin Films by Atmospheric Pressure Plasma Chemical Vapor Deposition. (1st Report). Design and Production of the Atmospheric Pressure Plasma CVD Apparatus with Rotary Electrode.
1999 ◽
Vol 65
(11)
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pp. 1600-1604
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2000 ◽
Vol 71
(8)
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pp. 3173-3177
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2000 ◽
Vol 66
(6)
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pp. 907-911
2006 ◽
Vol 45
(4B)
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pp. 3592-3597
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2013 ◽
Vol 31
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pp. 061508
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2004 ◽
Vol 70
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pp. 1075-1079