Metal Oxide Semiconductors: Direct Photopatterning of Solution-Processed Amorphous Indium Zinc Oxide and Zinc Tin Oxide Semiconductors-A Chimie Douce Molecular Precursor Approach to Thin Film Electronic Oxides (Adv. Mater. Interfaces 15/2018)

2018 ◽  
Vol 5 (15) ◽  
pp. 1870073
Author(s):  
Shawn Sanctis ◽  
Rudolf C. Hoffmann ◽  
Michael Bruns ◽  
Jörg J. Schneider
2019 ◽  
Vol 33 (5) ◽  
pp. 289-294
Author(s):  
Yong-Jin Kim ◽  
Jeong-Soo Lee ◽  
Yong-Uk Lee ◽  
Seung-Hwan Cho ◽  
Yong-Hoon Kim ◽  
...  

2018 ◽  
Vol 18 (9) ◽  
pp. 5913-5918 ◽  
Author(s):  
Kiwon Lim ◽  
Pyungho Choi ◽  
Sangsub Kim ◽  
Hyunki Kim ◽  
Minsoo Kim ◽  
...  

2019 ◽  
Vol 66 (6) ◽  
pp. 2631-2636 ◽  
Author(s):  
Chih-Chieh Hsu ◽  
Cheng-Han Chou ◽  
Yu-Ting Chen ◽  
Wun-Ciang Jhang

2021 ◽  
Vol 59 (3) ◽  
pp. 162-167
Author(s):  
Jae Young Kim ◽  
Geonoh Choe ◽  
Tae Kyu An ◽  
Yong Jin Jeong

Solution-processed zinc tin oxide (ZTO) thin-film transistors (TFTs) have great potential uses in next-generation wearable and flexible electronic products. Zinc and tin precursor materials are naturally abundant and have low fabrication costs. To integrate a single ZTO TFT into logic circuits including inverters, NAND, and NOR gates will require the development of a facile patterning process to replace conventional and complicated photolithography techniques which are usually time-consuming and toxic. In this study, self-patterned ZTO thin films were prepared using a photo-patternable precursor solution including a photoacid generator, (4-methylthiophenyl)methyl phenyl sulfonium triflate. Solution-processed ZTO precursor films fabricated with the photoacid generator were successfully micropatterned by UV exposure, and transitioned to a semiconducting ZTO thin film by heat treatment. The UV-irradiated precursor films became insoluble in developing solvent as the generated proton from the photoacid generator affected the metal-containing ligand and changed the solubility of the metal oxide precursors. The resulting ZTO thin films were utilized as the active layers of n-type TFTs, which exhibited a typical n-type transfer, and output characteristics with appropriate threshold voltage, on/off current ratio, and field-effect mobility. We believe that our work provides a convenient solution-based route to the fabrication of metal-oxide semiconductor patterns.


Nanomaterials ◽  
2020 ◽  
Vol 10 (7) ◽  
pp. 1304
Author(s):  
Heqing Ye ◽  
Hyeok-Jin Kwon ◽  
Xiaowu Tang ◽  
Dong Yun Lee ◽  
Sooji Nam ◽  
...  

The solution-processed deposition of metal-oxide semiconducting materials enables the fabrication of large-area and low-cost electronic devices by using printing technologies. Additionally, the simple patterning process of these types of materials become an important issue, as it can simplify the cost and process of fabricating electronics such as thin-film transistors (TFTs). In this study, using the electrohydrodynamic (EHD) jet printing technique, we fabricated directly patterned zinc-tin-oxide (ZTO) semiconductors as the active layers of TFTs. The straight lines of ZTO semiconductors were successfully drawn using a highly soluble and homogeneous solution that comprises zinc acrylate and tin-chloride precursors. Besides, we found the optimum condition for the fabrication of ZTO oxide layers by analyzing the thermal effect in processing. Using the optimized condition, the resulting devices exhibited satisfactory TFT characteristics with conventional electrodes and conducting materials. Furthermore, these metal-oxide TFTs were successfully applied to complementary inverter with conventional p-type organic semiconductor-based TFT, showing high quality of voltage transfer characteristics. Thus, these printed ZTO TFT results demonstrated that solution processable metal-oxide transistors are promising for the realization of a more sustainable and printable next-generation industrial technology.


2016 ◽  
Vol 4 (46) ◽  
pp. 10935-10944 ◽  
Author(s):  
Shawn Sanctis ◽  
Rudolf C. Hoffmann ◽  
Ruben Precht ◽  
Wolfgang Anwand ◽  
Jörg J. Schneider

Photoelectron emission spectroscopy and positron annihilation spectroscopy allow a comprehensive interpretation of the performance of IZO-based TFTs.


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