Nickel Oxide: Electron-Blocking and Oxygen Evolution Catalyst Layers by Plasma-Enhanced Atomic Layer Deposition of Nickel Oxide (Adv. Mater. Interfaces 16/2018)

Nanostructured metal oxides (MOs) demonstrate good electrochemical properties and are regarded as promising anode materials for high-performance lithium-ion batteries (LIBs). The capacity of nickel-cobalt oxides-based materials is among the highest for binary transition metals oxide (TMOs). In the present paper, we report the investigation of Ni-Co-O (NCO) thin films obtained by atomic layer deposition (ALD) using nickel and cobalt metallocenes in a combination with oxygen plasma. The formation of NCO films with different ratios of Ni and Co was provided by ALD cycles leading to the formation of nickel oxide (a) and cobalt oxide (b) in one supercycle (linear combination of a and b cycles). The film thickness was set by the number of supercycles. The synthesized films had a uniform chemical composition over the depth with an admixture of metallic nickel and carbon up to 4 at.%. All samples were characterized by a single NixCo1-xO phase with a cubic face-centered lattice and a uniform density. The surface of the NCO films was uniform, with rare inclusions of nanoparticles 15–30 nm in diameter. The growth rates of all films on steel were higher than those on silicon substrates, and this difference increased with increasing cobalt concentration in the films. In this paper, we propose a method for processing cyclic voltammetry curves for revealing the influence of individual components (nickel oxide, cobalt oxide and solid electrolyte interface—SEI) on the electrochemical capacity. The initial capacity of NCO films was augmented with an increase of nickel oxide content.

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Nickel–Carbon–Zirconium Material Derived from Nickel-Oxide Clusters Installed in a Metal–Organic Framework Scaffold by Atomic Layer Deposition

Langmuir ◽

10.1021/acs.langmuir.8b02166 ◽

2018 ◽

Vol 34 (47) ◽

pp. 14143-14150 ◽

Cited By ~ 3

Author(s):

Rebecca H. Palmer ◽

Chung-Wei Kung ◽

Jian Liu ◽

Omar K. Farha ◽

Joseph T. Hupp

Keyword(s):

Atomic Layer Deposition ◽

Nickel Oxide ◽

Metal Organic Framework ◽

Atomic Layer ◽

Layer Deposition ◽

Metal Organic ◽

Organic Framework

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Modulated electrochemical oxygen evolution catalyzed by MoS2 nanoflakes from atomic layer deposition

Nanotechnology ◽

10.1088/1361-6528/aaef13 ◽

2019 ◽

Vol 30 (9) ◽

pp. 095402 ◽

Cited By ~ 2

Author(s):

Yazhou Huang ◽

Lei Liu ◽

Xiaolin Liu

Keyword(s):

Atomic Layer Deposition ◽

Oxygen Evolution ◽

Atomic Layer ◽

Layer Deposition ◽

Electrochemical Oxygen

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Atomic layer deposition triggered Fe-In-S cluster and gradient energy band in ZnInS photoanode for improved oxygen evolution reaction

Nature Communications ◽

10.1038/s41467-021-25609-0 ◽

2021 ◽

Vol 12 (1) ◽

Author(s):

Linxing Meng ◽

Jinlu He ◽

Xiaolong Zhou ◽

Kaimo Deng ◽

Weiwei Xu ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Oxygen Evolution ◽

Oxygen Evolution Reaction ◽

Energy Band ◽

High Performance ◽

Carrier Transport ◽

Atomic Layer ◽

Onset Potential ◽

Layer Deposition ◽

Gradient Energy

AbstractVast bulk recombination of photo-generated carriers and sluggish surface oxygen evolution reaction (OER) kinetics severely hinder the development of photoelectrochemical water splitting. Herein, through constructing a vertically ordered ZnInS nanosheet array with an interior gradient energy band as photoanode, the bulk recombination of photogenerated carriers decreases greatly. We use the atomic layer deposition technology to introduce Fe-In-S clusters into the surface of photoanode. First-principles calculations and comprehensive characterizations indicate that these clusters effectively lower the electrochemical reaction barrier on the photoanode surface and promote the surface OER reaction kinetics through precisely affecting the second and third steps (forming processes of O* and OOH*) of the four-electron reaction. As a result, the optimal photoanode exhibits the high performance with a significantly enhanced photocurrent of 5.35 mA cm−2 at 1.23 VRHE and onset potential of 0.09 VRHE. Present results demonstrate a robust platform for controllable surface modification, nanofabrication, and carrier transport.

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Atomic layer deposition for efficient oxygen evolution reaction at Pt/Ir catalyst layers

Beilstein Journal of Nanotechnology ◽

10.3762/bjnano.11.79 ◽

2020 ◽

Vol 11 ◽

pp. 952-959

Author(s):

Stefanie Schlicht ◽

Korcan Percin ◽

Stefanie Kriescher ◽

André Hofer ◽

Claudia Weidlich ◽

...

Keyword(s):

Atomic Layer Deposition ◽

Noble Metal ◽

Bimetallic Catalyst ◽

Precursor Solution ◽

Atomic Layer ◽

Dip Coating ◽

Experimental Conditions ◽

Catalyst Layers ◽

Layer Deposition ◽

Improved Stability

We provide a direct comparison of two distinct methods of Ti felt surface treatment and Pt/Ir electrocatalyst deposition for the positive electrode of regenerative fuel cells and vanadium–air redox flow batteries. Each method is well documented in the literature, and this paper provides a direct comparison under identical experimental conditions of electrochemical measurements and in identical units. In the first method, based on classical engineering, the bimetallic catalyst is deposited by dip-coating in a precursor solution of the salts followed by their thermal decomposition. In the alternative method, more academic in nature, atomic layer deposition (ALD) is applied to the felts after anodization. ALD allows for a controlled coating with ultralow noble-metal loadings in narrow pores. In acidic electrolyte, the ALD approach yields improved mass activity (557 A·g−1 as compared to 80 A·g−1 at 0.39 V overpotential) on the basis of the noble-metal loading, as well as improved stability.

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