Long-chain branching of polypropylene by electron-beam irradiation in the molten state

2005 ◽  
Vol 99 (1) ◽  
pp. 260-265 ◽  
Author(s):  
B. Krause ◽  
M. Stephan ◽  
S. Volkland ◽  
D. Voigt ◽  
L. Häußler ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Irradiation ◽  
Molten State ◽  
Beam Irradiation ◽  
Chain Branching ◽  
Long Chain Branching ◽  
Long Chain

Long-Chain Branched Polypropylenes by Electron Beam Irradiation and Their Rheological Properties

2004 ◽  
Vol 37 (25) ◽  
pp. 9465-9472 ◽  
Author(s):  
Dietmar Auhl ◽  
Jens Stange ◽  
Helmut Münstedt ◽  
Beate Krause ◽  
Dieter Voigt ◽  
...  
Keyword(s):  
Electron Beam ◽  
Rheological Properties ◽  
Electron Beam Irradiation ◽  
Beam Irradiation ◽  
Long Chain

Theoretical correlation of linear and non-linear rheological symptoms of long-chain branching in polyethylenes irradiated by electron beam at relatively low doses

2017 ◽  
Vol 56 (9) ◽  
pp. 729-742 ◽  
Author(s):  
Mehdi Entezam ◽  
Mahdi Abbasi ◽  
Mostafa Ahmadi
Keyword(s):  
Electron Beam ◽  
Low Doses ◽  
Chain Branching ◽  
Long Chain Branching ◽  
Non Linear ◽  
Long Chain

Rheological and topological characterizations of electron beam irradiation prepared long-chain branched polylactic acid

2011 ◽  
Vol 122 (3) ◽  
pp. 1857-1865 ◽  
Author(s):  
Yongbin Wang ◽  
Liang Yang ◽  
Yanhua Niu ◽  
Zhigang Wang ◽  
Jun Zhang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Polylactic Acid ◽  
Electron Beam Irradiation ◽  
Beam Irradiation ◽  
Long Chain

Methods to Monitor and Improve the Performance of Specimen Holders for Transmission Electron Cryomicroscopy

1996 ◽  
Vol 54 ◽  
pp. 454-455
Author(s):  
B. L. Armbruster ◽  
B. Kraus ◽  
M. Pan
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Electron Beam Irradiation ◽  
Beam Irradiation ◽  
Quality Of Data ◽  
Electron Cryomicroscopy ◽  
Thermal Equilibration ◽  
Transmission Electron ◽  
Electron Microscopes

One goal in electron microscopy of biological specimens is to improve the quality of data to equal the resolution capabilities of modem transmission electron microscopes. Radiation damage and beam- induced movement caused by charging of the sample, low image contrast at high resolution, and sensitivity to external vibration and drift in side entry specimen holders limit the effective resolution one can achieve. Several methods have been developed to address these limitations: cryomethods are widely employed to preserve and stabilize specimens against some of the adverse effects of the vacuum and electron beam irradiation, spot-scan imaging reduces charging and associated beam-induced movement, and energy-filtered imaging removes the “fog” caused by inelastic scattering of electrons which is particularly pronounced in thick specimens.Although most cryoholders can easily achieve a 3.4Å resolution specification, information perpendicular to the goniometer axis may be degraded due to vibration. Absolute drift after mechanical and thermal equilibration as well as drift after movement of a holder may cause loss of resolution in any direction.

Development and Characteristics of Pulsed Radiation Source Generated by Electron Beam Irradiation using Intense Pulsed Power Generator

2019 ◽  
Vol 139 (10) ◽  
pp. 435-436
Author(s):  
Kenji Kashine ◽  
Fumihiro Tamura ◽  
Takashi Kikuchi ◽  
Weihua Jiang
Keyword(s):  
Electron Beam ◽  
Radiation Source ◽  
Electron Beam Irradiation ◽  
Pulsed Power ◽  
Beam Irradiation ◽  
Power Generator ◽  
Pulsed Power Generator

A Study of Electron Beam Irradiation Influence on Device Contact Junction Characteristics of Advanced DRAM Using Atomic Force Probing

2013 ◽  
Author(s):  
Wei-Chih Wang ◽  
Jian-Shing Luo
Keyword(s):  
Electron Beam ◽  
Electron Beam Irradiation ◽  
Forward Bias ◽  
Irradiation Damage ◽  
Beam Irradiation ◽  
Excess Current ◽  
Atomic Force ◽  
Order Of Magnitude ◽  
Voltage Contrast ◽  
Acceleration Voltage

Abstract In this paper, we revealed p+/n-well and n+/p-well junction characteristic changes caused by electron beam (EB) irradiation. Most importantly, we found a device contact side junction characteristic is relatively sensitive to EB irradiation than its whole device characteristic; an order of magnitude excess current appears at low forward bias region after 1kV EB acceleration voltage irradiation (Vacc). Furthermore, these changes were well interpreted by our Monte Carlo simulation results, the Shockley-Read Hall (SRH) model and the Generation-Recombination (G-R) center trap theory. In addition, four essential examining items were suggested and proposed for EB irradiation damage origins investigation and evaluation. Finally, by taking advantage of the excess current phenomenon, a scanning electron microscope (SEM) passive voltage contrast (PVC) fault localization application at n-FET region was also demonstrated.

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