ChemInform Abstract: Chemical Vapor Deposition of Ru Thin Films with an Enhanced Morphology, Thermal Stability, and Electrical Properties Using a RuO4Precursor.
Keyword(s):
Keyword(s):
2006 ◽
Vol 6
(11)
◽
pp. 3479-3482
1997 ◽
Vol 14
(1-4)
◽
pp. 105-113
◽
2004 ◽
Vol 22
(3)
◽
pp. 570
◽
2016 ◽
Vol 51
(11)
◽
pp. 5082-5091
◽
1994 ◽
Vol 253
(1-2)
◽
pp. 435-439
◽
Keyword(s):
Keyword(s):