AlGaN/GaN Heterostructures Electrical Performance by Altering GaN/Sapphire Buffers Growth Pressure and Low‐Temperature GaN Interlayers Application

2021 ◽  
pp. 2100090
Author(s):  
Mateusz Wośko ◽  
Bogdan Paszkiewicz ◽  
Regina Paszkiewicz
2021 ◽  
Vol 13 (1) ◽  
Author(s):  
Muhammad Naqi ◽  
Kyung Hwan Choi ◽  
Hocheon Yoo ◽  
Sudong Chae ◽  
Bum Jun Kim ◽  
...  

AbstractLow-temperature-processed semiconductors are an emerging need for next-generation scalable electronics, and these semiconductors need to feature large-area fabrication, solution processability, high electrical performance, and wide spectral optical absorption properties. Although various strategies of low-temperature-processed n-type semiconductors have been achieved, the development of high-performance p-type semiconductors at low temperature is still limited. Here, we report a unique low-temperature-processed method to synthesize tellurium nanowire networks (Te-nanonets) over a scalable area for the fabrication of high-performance large-area p-type field-effect transistors (FETs) with uniform and stable electrical and optical properties. Maximum mobility of 4.7 cm2/Vs, an on/off current ratio of 1 × 104, and a maximum transconductance of 2.18 µS are achieved. To further demonstrate the applicability of the proposed semiconductor, the electrical performance of a Te-nanonet-based transistor array of 42 devices is also measured, revealing stable and uniform results. Finally, to broaden the applicability of p-type Te-nanonet-based FETs, optical measurements are demonstrated over a wide spectral range, revealing an exceptionally uniform optical performance.


2008 ◽  
Vol 5 (4) ◽  
pp. 156-160 ◽  
Author(s):  
Peter Uhlig ◽  
Dirk Manteuffel ◽  
Stefan Malkmus

The adaptation of the LTCC (Low Temperature Cofired Ceramics) process for an unusually high number of layers (up to 50) will be described and explained in this paper. Special attention will be paid to lamination, debindering, and cofiring of the LTCC stack. The influence of necessary process variations on electrical properties such as permittivity will be studied. Very often the number of layers is determined by the complexity of the circuit. Here a minimum substrate height is required for the electrical performance of a patch antenna, particularly in terms of bandwidth. A dual band antenna for two Galileo bands at 1.58 GHz and 1.18 GHz was realized as a combination of two coupled patches. Circular polarization was attained by separately feeding each patch with a hybrid coupler. These features add further layers to an already considerable substrate height.


Author(s):  
Changsheng Ding ◽  
Hongfei Lin ◽  
Kazuhisa Sato ◽  
Toshiyuki Hashida

La0.8Sr0.2Co0.8Fe0.2O3 (LSCF) nanopowders, which are being investigated as a promising cathode material for low-temperature solid oxide fuel cells (SOFCs), were synthesized by citric acid gel combustion method. The LSCF nanopowders synthesized at 700°C are single perovskite phases and have an average particle size of less than 30 nm. In order to evaluate the use of the synthesized LSCF nanopowders as cathode material of low-temperature SOFCs, anode-supported SOFCs were fabricated from the synthesized LSCF nanopowders and tested in the conditions of humidified hydrogen for anode and oxygen for cathode. The anode-supported single cell with the LSCF cathode sintered at 700°C showed high electrical performance with the maximum power density of 771 mW cm−2 at 600°C. The results show that the synthesized LSCF nanopowders are suitable to be applied as cathode material for low-temperature SOFCs.


2015 ◽  
Vol 1731 ◽  
Author(s):  
Miguel A. Dominguez ◽  
Francisco Flores ◽  
Adan Luna ◽  
Salvador Alcantara ◽  
Javier Martinez ◽  
...  

ABSTRACTIn this work, the annealing effects at 180°C in Aluminum-ZnO contacts as function of time were studied. Also, the application in TFTs of ZnO films obtained at low-temperature (200°C) are presented. The ZnO films obtained by ultrasonic Spray Pyrolysis at 200 °C were deposited over Aluminum contacts on SiO2/Si wafers to demonstrate the use of active layer in thin-film transistors. The results show that an improvement can be obtained in metal-ZnO interfaces by low-temperature annealing treatments. However, long annealing time degrade the metal-ZnO interface and may affect the electrical performance of the device.


Sign in / Sign up

Export Citation Format

Share Document