A Micro-pulse Process of Atomic Layer Deposition of Iron Oxide Using Ferrocene and Ozone Precursors and Ti-Doping

2013 ◽  
Vol 19 (4-6) ◽  
pp. 104-110 ◽  
Author(s):  
Xianglin Li ◽  
Ng Chin Fan ◽  
Hong Jin Fan
Keyword(s):  
Iron Oxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Ozone Precursors ◽  
Pulse Process ◽  
Layer Deposition ◽  
Ti Doping

Atomic layer deposition of rare earth oxides: erbium oxide thin films from β-diketonate and ozone precursors

2004 ◽  
Vol 374 (1-2) ◽  
pp. 124-128 ◽  
Author(s):  
Jani Päiväsaari ◽  
Matti Putkonen ◽  
Timo Sajavaara ◽  
Lauri Niinistö
Keyword(s):  
Thin Films ◽  
Rare Earth ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Rare Earth Oxides ◽  
Erbium Oxide ◽  
Oxide Thin Films ◽  
Ozone Precursors ◽  
Layer Deposition

Stabilization of Mesoporous Iron Oxide Films against Sintering and Phase Transformations via Atomic Layer Deposition of Alumina and Silica

2018 ◽  
Vol 5 (14) ◽  
pp. 1800360 ◽  
Author(s):  
Katrin Kraffert ◽  
Matthias Karg ◽  
Roman Schmack ◽  
Guylhaine Clavel ◽  
Cedric Boissiere ◽  
...  
Keyword(s):  
Iron Oxide ◽  
Atomic Layer Deposition ◽  
Phase Transformations ◽  
Oxide Films ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Iron Oxide Films

scholarly journals The Influence of Ozone: Superstoichiometric Oxygen in Atomic Layer Deposition of Fe2O3 Using tert-Butylferrocene and O3

2019 ◽  
Author(s):  
Joel Schneider ◽  
Jon Baker ◽  
Stacey Bent
Keyword(s):  
Iron Oxide ◽  
Atomic Layer Deposition ◽  
Growth Mechanism ◽  
Material Characterization ◽  
Atomic Layer ◽  
Ozone Exposure ◽  
Mechanistic Study ◽  
Domain Orientation ◽  
Layer Deposition

This work demonstrates a mechanistic study of iron oxide deposited by ALD, revealing a growth mechanism involving uptake of superstoichiometric oxygen. Material characterization shows ozone exposure can be used to convert the crystallographic phase and domain orientation of the materials. This mechanism has implications for wider classes of ozone-based ALD processes and can generalize to other systems.<br>

A multi-level memristor based on atomic layer deposition of iron oxide

2018 ◽  
Vol 29 (49) ◽  
pp. 495201 ◽  
Author(s):  
Samuele Porro ◽  
Katarzyna Bejtka ◽  
Alladin Jasmin ◽  
Marco Fontana ◽  
Gianluca Milano ◽  
...  
Keyword(s):  
Iron Oxide ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Multi Level

Atomic layer deposition of ZnO/TiO2 multilayers: towards the understanding of Ti-doping in ZnO thin films

RSC Advances ◽  
2016 ◽  
Vol 6 (91) ◽  
pp. 88886-88895 ◽  
Author(s):  
G. Torrisi ◽  
A. Di Mauro ◽  
M. Scuderi ◽  
G. Nicotra ◽  
G. Impellizzeri
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Zno Thin Films ◽  
Layer Deposition ◽  
Doped Zno ◽  
Ti Doping

Undoped and Ti-doped ZnO (TZO) films were deposited by atomic layer deposition (ALD).

Enhanced cycle life and capacity retention of iron oxide ultrathin film coated SnO2 nanoparticles at high current densities

RSC Advances ◽  
2016 ◽  
Vol 6 (29) ◽  
pp. 24340-24348 ◽  
Author(s):  
Sai Abhishek Palaparty ◽  
Rajankumar L. Patel ◽  
Xinhua Liang
Keyword(s):  
Iron Oxide ◽  
Atomic Layer Deposition ◽  
Ultrathin Films ◽  
Sno2 Nanoparticles ◽  
Atomic Layer ◽  
Cycle Life ◽  
High Current ◽  
Capacity Retention ◽  
Layer Deposition ◽  
Current Densities

Optimally thick and conformal iron oxide (FeOx) ultrathin films coated on SnO2 nanoparticles by atomic layer deposition significantly improve the cycle life and capacity retention when operated in a practical voltage window at high current densities.

Hydrogen Production via Chemical Looping Redox Cycles Using Atomic Layer Deposition-Synthesized Iron Oxide and Cobalt Ferrites

2011 ◽  
Vol 23 (8) ◽  
pp. 2030-2038 ◽  
Author(s):  
Jonathan R. Scheffe ◽  
Mark D. Allendorf ◽  
Eric N. Coker ◽  
Benjamin W. Jacobs ◽  
Anthony H. McDaniel ◽  
...  
Keyword(s):  
Iron Oxide ◽  
Hydrogen Production ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Chemical Looping ◽  
Redox Cycles ◽  
Cobalt Ferrites ◽  
Layer Deposition
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