Interface defects and impurities at the growth zone of Au-catalyzed GaAs nanowire from first principles

2013 ◽  
Vol 7 (10) ◽  
pp. 882-885 ◽  
Author(s):  
Sung Sakong ◽  
Yaojun A. Du ◽  
Peter Kratzer
2000 ◽  
Vol 640 ◽  
Author(s):  
S. T. Pantelides ◽  
R. Buczko ◽  
M. Di Ventra ◽  
S. Wang ◽  
S.-G. Kim ◽  
...  

ABSTRACTThis paper presents a review of new results obtained by a combination of first-principles theory, Z-contrast imaging, and electron-energy-loss spectroscopy in the context of a broader experimental/theoretical program to understand and control the atomic-scale structure of SiCSiO2 interfaces. The ultimate purpose is to achieve low interface trap densities for device applications. Results are given for global bonding arrangements in comparison with those of the Si-SiO2 interface, the mechanism of the oxidation process, the nature of possible interface defects and their passivation by N and H, and the formation and dissolution of C clusters in SiO2 during oxidation and reoxidation.


2009 ◽  
Vol 1164 ◽  
Author(s):  
Mao-Hua Du ◽  
Hiroyuki Takenaka ◽  
David Joseph Singh

AbstractWe discuss defect engineering strategies in radiation detector materials. The goal is to increase resistivity by defect-induced Fermi level pinning without causing defect-induced reductions in the carrier drifting length. We show calculated properties of various intrinsic defects and impurities in CdTe. We suggest that the defect complex of a hydrogen atom and an isovalent impurity on an anion site may be an excellent candidate in many semiconductors for Fermi level pinning without carrier trapping.


2018 ◽  
Vol 4 (1) ◽  
Author(s):  
Sanjeev K. Nayak ◽  
Cain J. Hung ◽  
Vinit Sharma ◽  
S. Pamir Alpay ◽  
Avinash M. Dongare ◽  
...  

1998 ◽  
Vol 51 (1-3) ◽  
pp. 53-57 ◽  
Author(s):  
J.L.P Castineira ◽  
J.R Leite ◽  
L.M.R Scolfaro ◽  
R Enderlein ◽  
J.L.A Alves ◽  
...  

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