82‐2: Invited Paper: Roll‐to‐Roll Processing of Polysilicon TFTs on Flexible Large Area Stainless Steel Substrates

2019 ◽  
Vol 50 (1) ◽  
pp. 1183-1186
Author(s):  
Aditi Chandra ◽  
Arvind Kamath ◽  
Scott Bruner ◽  
Patricia Beck ◽  
Peter Fischer
2003 ◽  
Vol 763 ◽  
Author(s):  
A. Kampmann ◽  
J. Rechid ◽  
A. Raitzig ◽  
S. Wulff ◽  
M. Mihhailova ◽  
...  

AbstractThe development of a low cost roll-to-roll production process for CIGS remains an attractive goal. In the present approach, the absorber is prepared by electrodeposition techniques, while molybdenum, copper or stainless steel (SS) are used as flexible substrates. Two electrodeposition routes are evaluated: sequential plating of Cu, In and Ga followed by Se evaporation is compared to simultaneous (= ternary) electrodeposition of Cu, In and Se. Ternary electrodeposition yields 7.5 % efficiency on stainless steel. The sequential process leads to 9.0 % cell efficiency on copper and on stainless steel substrates.


2002 ◽  
Vol 37 (4) ◽  
pp. 661-669 ◽  
Author(s):  
M. Dinamani ◽  
P.Vishnu Kamath ◽  
R. Seshadri

2013 ◽  
Vol 844 ◽  
pp. 158-161 ◽  
Author(s):  
M.I. Maksud ◽  
Mohd Sallehuddin Yusof ◽  
M. Mahadi Abdul Jamil

Recently low cost production is vital to produce printed electronics by roll to roll manufacturing printing process like a flexographic. Flexographic has a high speed technique which commonly used for printing onto large area flexible substrates. However, the minimum feature sizes achieved with roll to roll printing processes, such as flexographic is in the range of fifty microns. The main contribution of this limitation is photopolymer flexographic plate unable to be produced finer micron range due to film that made by Laser Ablation Mask (LAMs) technology not sufficiently robust and consequently at micron ranges line will not be formed on the printing plate. Hence, polydimethylsiloxane (PDMS) is used instead of photopolymer. Printing trial had been conducted and multiple solid lines successfully printed for below fifty microns line width with no interference between two adjacent lines of the printed images.


2021 ◽  
pp. 100135
Author(s):  
Shuai Jia ◽  
Weibing Chen ◽  
Jing Zhang ◽  
Chen-Yang Lin ◽  
Hua Guo ◽  
...  

2015 ◽  
Vol 123 (1437) ◽  
pp. 322-328 ◽  
Author(s):  
Kohei NAGASAKA ◽  
Naoya OSHIMA ◽  
Jin Woong KIM ◽  
Hiromi SHIMA ◽  
Akihiro AKAMA ◽  
...  

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