Preparation of in-plane aligned Yb123 films by metalorganic deposition processing

1997 ◽  
pp. 1059-1062 ◽  
Author(s):  
Katsuya Yamagiwa ◽  
Izumi Hirabayashi ◽  
Shoji Tanaka
Keyword(s):  
Metalorganic Deposition

Formation of thin‐film highTcsuperconductors by metalorganic deposition

1987 ◽  
Vol 51 (25) ◽  
pp. 2152-2154 ◽  
Author(s):  
A. H. Hamdi ◽  
J. V. Mantese ◽  
A. L. Micheli ◽  
R. C. O. Laugal ◽  
D. F. Dungan ◽  
...  
Keyword(s):  
Thin Film ◽  
Metalorganic Deposition

Crystallization of Epitaxial Lanthanum Aluminate and Spinel Thin Films Derived from Nitrate Precursors

1994 ◽  
Vol 341 ◽  
Author(s):  
Man Fai Ng ◽  
Michael J. Cima
Keyword(s):  
Thin Films ◽  
Epitaxial Film ◽  
Amorphous Film ◽  
Zero Field ◽  
Epitaxial Thin Films ◽  
Lanthanum Aluminate ◽  
Initial Nucleation ◽  
Metalorganic Deposition ◽  
Current Densities ◽  
Higher Temperature

AbstractBoth lanthanum aluminate (LaAIO 3) and spinel (MgAl2O 4) epitaxial thin films have been deposited on either planar and stepped (100) SrTiO3 single crystal substrates by pyrolysis of mixed nitrate precursors. The precursors pyrolyze initially into amorphous films. Nucleation of lanthanum aluminate and spinel occurs at the filnVsubstrate interface at higher temperature. Crystallization of LaAlO3 on SrTiO3 substrates occurs at approximately 650°C, whereas nucleation occurs at approximately 800'C without lattice-matched substrates. Similarly, latticematched substrates reduce the crystallization temperature of spinel to below 700°C. The epitaxial film grows at the expense of the amorphous film after the initial nucleation at the interface. The rapid growth and volume change due to the crystallization leave behind an epitaxial film with nanoporosity of 15 to 30 nm. Nevertheless, the surfaces of these films have roughness of only 6–9 Å. Ba2Ycu3O7-x films derived from metalorganic deposition of metal trifluoroacetate precursors was deposited on these epitaxial LaAlO3 films on both planar and stepped SrTiO3 substrates. The resultant YBCO films on LaAlO3 film on planar SrTiO3 substrate have critical current densities of > 2 × 106 A/cm2 at 77K and zero field.

Metalorganic Deposition (MOD): A Nonvacuum, Spin-on, Liquid-Based, Thin Film Method

MRS Bulletin ◽  
1989 ◽  
Vol 14 (10) ◽  
pp. 48-53 ◽  
Author(s):  
J.V. Mantese ◽  
A.L. Micheli ◽  
A.H. Hamdi ◽  
R.W. Vest
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Substrate Surface ◽  
Chemical Vapor ◽  
Deposition Process ◽  
Organic Precursor ◽  
Metalorganic Deposition ◽  
Constituent Elements ◽  
Film Method

There are many methods of depositing thin film materials: thermal evaporation, sputtering, electron or laser beam evaporation, chemical vapor deposition (CVD), and molecular beam epitaxy (MBE). A good survey of many of the deposition methods appears in the 1988 November and December issues of the MRS BULLETIN. One method not included in that survey, however, is metalorganic deposition (MOD), a powerful method for depositing a variety of materials.Metalorganic deposition is not to be confused with metalorganic chemical vapor deposition (MOCVD), which is a gaseous deposition method. MOD is a nonvacuum, liquid-based, spin-on method of depositing thin films. A suitable organic precursor, dissolved in solution, is dispensed onto a substrate much like photoresist. The substrate is spun at a few thousand revolutions per minute, removing the excess fluid, driving off the solvent, and uniformly coating the substrate surface with an organic film a few microns thick. The soft metalorganic film is then pyrolyzed in air, oxygen, nitrogen, or other suitable atmosphere to convert the metalorganic precursors to their constituent elements, oxides, or other compounds. Figure 1 shows a schematic of the deposition process including a prebake and annealing (if necessary).

scholarly journals Positive and Negative Lithography by Photochemical Metalorganic Deposition from Metal 2-ethylhexanoates

2006 ◽  
Vol 19 (4) ◽  
pp. 467-475 ◽  
Author(s):  
Simon Tradel ◽  
Guizhi Li ◽  
Xin Zhang ◽  
Ross H. Hill
Keyword(s):  
Metalorganic Deposition

Metalorganic deposition of high‐JcBa2YCu3O7−xthin films from trifluoroacetate precursors onto (100) SrTiO3

1990 ◽  
Vol 68 (8) ◽  
pp. 4183-4187 ◽  
Author(s):  
Paul C. McIntyre ◽  
Michael J. Cima ◽  
Man Fai Ng
Keyword(s):  
Metalorganic Deposition

scholarly journals Photolithographic Deposition of Ruthenium Thin Films by Photochemical Metalorganic Deposition

2006 ◽  
Vol 19 (4) ◽  
pp. 459-465 ◽  
Author(s):  
Guizhi Li ◽  
Simon Trudel ◽  
Ross H. Hill
Keyword(s):  
Thin Films ◽  
Metalorganic Deposition

Bi-Based Superconducting Thin Films Prepared by a Combination of Metalorganic Deposition (MOD) and a Diffusion Process

1990 ◽  
Vol 29 (Part 2, No. 12) ◽  
pp. L2211-L2214
Author(s):  
Seiji Yaegashi ◽  
Mark Green ◽  
Hirohiko Murakami ◽  
Junya Nishino ◽  
Yuh Shiohara ◽  
...  
Keyword(s):  
Thin Films ◽  
Diffusion Process ◽  
Superconducting Thin Films ◽  
Metalorganic Deposition

Photovoltaic Effect with the Structural Control and its Application to the Optical Sensor

2006 ◽  
Vol 320 ◽  
pp. 61-64
Author(s):  
Masaaki Ichiki ◽  
Harumi Furue ◽  
Takeshi Kobayashi ◽  
Yasushi Morikawa ◽  
Kazuhiro Nonaka ◽  
...  
Keyword(s):  
Optical Sensor ◽  
Structural Control ◽  
Photovoltaic Effect ◽  
Electrical Power ◽  
Dark Conductivity ◽  
Lead Lanthanum Zirconate Titanate ◽  
Lanthanum Zirconate ◽  
Micro Electro Mechanical Systems ◽  
Oriented Films ◽  
Metalorganic Deposition

Photovoltaic lead lanthanum zirconate titanate films in a layered structure of different crystallographic orientations are fabricated by an optimized metalorganic deposition method. Such films of (001) orientation exhibit a photovoltaic electrical power of approximately 20 times higher than that of random films. The anisotropic optical properties of the oriented films, including dark conductivity, photoconductivity and photovoltaic tensor surfaces, are obtained quantitatively. These results show that the photovoltaic output current and power of the oriented films are highly improved to be equal to those of semiconductors and suitable for application in the optical sensor of micro-electro-mechanical systems.

Sign in / Sign up

Export Citation Format

Share Document