Transition metal nitride and carbide nanoparticles

Author(s):  
R. Ochoa ◽  
X. X. Bi ◽  
A. M. Rao ◽  
P. C. Eklund
2021 ◽  
Author(s):  
Khang D. Pham ◽  
Cuong Q. Nguyen ◽  
C. V. Nguyen ◽  
Pham V. Cuong ◽  
Nguyen V. Hieu

Graphene-based van der Waals (vdW) heterostructures have attracted much attention because they can enhance the properties of separated materials, possess numerous new phenomena and unusual properties and improve the performance of devices.


2007 ◽  
Vol 4 (2) ◽  
pp. 269-271
Author(s):  
M. Ribeiro ◽  
L. M. R. Scolfaro ◽  
L. K. Teles ◽  
M. Marques ◽  
L. G. Ferreira

Author(s):  
Rayane Ricardo da Silva ◽  
Carlson Pereira de Souza ◽  
André Luís Lopes Moriyama

2012 ◽  
Vol 57 (32) ◽  
pp. 4111-4118 ◽  
Author(s):  
YanHua Yue ◽  
PengXian Han ◽  
ShanMu Dong ◽  
KeJun Zhang ◽  
ChuanJian Zhang ◽  
...  

2005 ◽  
Vol 502 ◽  
pp. 81-86 ◽  
Author(s):  
Yukio Makino

Hardness of the pseudobinary transition metal aluminum nitride (T-Al-N) films is improved with increasing the AlN content as far as the B1structure is maintained. A drastic change in the compositional dependence of the hardness corresponds to the phase change of the pseudobinary nitride from B1(NaCl) to B4(wurtzite) structure. Predicted value of AlN content for the drastic change agrees with the AlN content determined experimentally. Hardness of various T-Al-N films was closely correlated with the bulk modulus calculated from interatomic distance based on the power functional formula. The improvement of hardness is attributed to the inherent increase of bulk modulus due to dissolution of AlN into transition metal nitride.


Sign in / Sign up

Export Citation Format

Share Document