The X-ray and extreme ultraviolet radiation of the August 28, 1966 proton flare as deduced from sudden ionospheric disturbance data

Solar Physics ◽  
1968 ◽  
Vol 5 (1) ◽  
pp. 123-126 ◽  
Author(s):  
R. F. Donnelly
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Ionospheric Disturbance ◽  
X Ray ◽  
Extreme Ultraviolet Radiation

scholarly journals Multilayer Reflective Coatings for BEUV Lithography: A Review

Nanomaterials ◽  
2021 ◽  
Vol 11 (11) ◽  
pp. 2782
Author(s):  
Paul C. Uzoma ◽  
Salman Shabbir ◽  
Huan Hu ◽  
Paul C. Okonkwo ◽  
Oleksiy V. Penkov
Keyword(s):  
Ultraviolet Radiation ◽  
Multilayer Film ◽  
Extreme Ultraviolet ◽  
Crucial Point ◽  
Optical Wave ◽  
X Ray ◽  
Development Status ◽  
Design Concepts ◽  
Extreme Ultraviolet Radiation ◽  
Reflective Coatings

The development of microelectronics is always driven by reducing transistor size and increasing integration, from the initial micron-scale to the current few nanometers. The photolithography technique for manufacturing the transistor needs to reduce the wavelength of the optical wave, from ultraviolet to the extreme ultraviolet radiation. One approach toward decreasing the working wavelength is using lithography based on beyond extreme ultraviolet radiation (BEUV) with a wavelength around 7 nm. The BEUV lithography relies on advanced reflective optics such as periodic multilayer film X-ray mirrors (PMMs). PMMs are artificial Bragg crystals having alternate layers of “light” and “heavy” materials. The periodicity of such a structure is relatively half of the working wavelength. Because a BEUV lithographical system contains at least 10 mirrors, the optics’ reflectivity becomes a crucial point. The increasing of a single mirror’s reflectivity by 10% will increase the system’s overall throughput six-fold. In this work, the properties and development status of PMMs, particularly for BEUV lithography, were reviewed to gain a better understanding of their advantages and limitations. Emphasis was given to materials, design concepts, structure, deposition method, and optical characteristics of these coatings.

Plasma-based sources of extreme ultraviolet radiation for lithography and mask inspection

2018 ◽  
Vol 189 (03) ◽  
pp. 323-334 ◽  
Author(s):  
D.B. Abramenko ◽  
P.S. Antsiferov ◽  
D.I. Astakhov ◽  
Aleksandr Yu. Vinokhodov ◽  
Il'ya Yu. Vichev ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Mask Inspection ◽  
Extreme Ultraviolet Radiation

Ponderomotive shifts induced by intense laser-driven coherent extreme ultraviolet radiation

2021 ◽  
Vol 54 (8) ◽  
pp. 084002
Author(s):  
I Orfanos ◽  
E Skantzakis ◽  
I Liontos ◽  
P Tzallas ◽  
D Charalambidis
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Intense Laser ◽  
Extreme Ultraviolet Radiation

scholarly journals Generation of coherent phonons by coherent extreme ultraviolet radiation in a transient grating experiment

2018 ◽  
Vol 113 (22) ◽  
pp. 221905 ◽  
Author(s):  
A. A. Maznev ◽  
F. Bencivenga ◽  
A. Cannizzo ◽  
F. Capotondi ◽  
R. Cucini ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Transient Grating ◽  
Coherent Phonons ◽  
Extreme Ultraviolet Radiation

scholarly journals IR-assisted ionization of helium by attosecond extreme ultraviolet radiation

2010 ◽  
Vol 12 (1) ◽  
pp. 013008 ◽  
Author(s):  
P Ranitovic ◽  
X M Tong ◽  
B Gramkow ◽  
S De ◽  
B DePaola ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Extreme Ultraviolet Radiation

Extreme Ultraviolet Radiation: A Means of Ion Activation for Tandem Mass Spectrometry

2018 ◽  
Vol 90 (12) ◽  
pp. 7176-7180 ◽  
Author(s):  
Alexandre Giuliani ◽  
Jonathan P. Williams ◽  
Martin R. Green
Keyword(s):  
Mass Spectrometry ◽  
Tandem Mass Spectrometry ◽  
Ultraviolet Radiation ◽  
Extreme Ultraviolet ◽  
Tandem Mass ◽  
Ion Activation ◽  
Extreme Ultraviolet Radiation

Laser-driven compact free electron laser: from extreme ultraviolet radiation to x-rays

2021 ◽  
Author(s):  
Alexander Molodozhentsev ◽  
Konstantin Kruchinin ◽  
Gabriele M. Grittani ◽  
Tyler Green ◽  
Jaroslav Nejdl ◽  
...  
Keyword(s):  
Ultraviolet Radiation ◽  
Free Electron ◽  
Free Electron Laser ◽  
Extreme Ultraviolet ◽  
X Rays ◽  
Extreme Ultraviolet Radiation
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