Mechanical properties of amorphous carbon nitride thin films prepared by reactive magnetron sputter-deposition

1995 ◽  
Vol 1 (1) ◽  
pp. 87-93 ◽  
Author(s):  
Dong Li ◽  
Yip-Wah Chung ◽  
Ming-Show Wong ◽  
William D. Sproul
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Sputter Deposition ◽  
Reactive Magnetron ◽  
Magnetron Sputter Deposition ◽  
Amorphous Carbon Nitride ◽  
Magnetron Sputter

Correlation between bonding structure and mechanical properties of amorphous carbon nitride thin films

2000 ◽  
Vol 125 (1-3) ◽  
pp. 284-288 ◽  
Author(s):  
C. Quirós ◽  
R. Núñez ◽  
P. Prieto ◽  
I. Vergara ◽  
D. Cáceres ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Properties ◽  
Amorphous Carbon ◽  
Carbon Nitride ◽  
Bonding Structure ◽  
Amorphous Carbon Nitride

scholarly journals Macrocrystalline silicon thin films prepared by RF reactive magnetron sputter deposition

Vacuum ◽  
1995 ◽  
Vol 46 (12) ◽  
pp. 1385-1390 ◽  
Author(s):  
MF Cerqueira ◽  
M Andritschky ◽  
L Rebouta ◽  
JA Ferreira ◽  
MF da Silva
Keyword(s):  
Thin Films ◽  
Sputter Deposition ◽  
Reactive Magnetron ◽  
Silicon Thin Films ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Multi-component (Al,Cr,Nb,Y,Zr)N thin films by reactive magnetron sputter deposition for increased hardness and corrosion resistance

2020 ◽  
Vol 693 ◽  
pp. 137685 ◽  
Author(s):  
Kristina von Fieandt ◽  
Eirini-Maria Paschalidou ◽  
Aishwarya Srinath ◽  
Pavel Soucek ◽  
Lars Riekehr ◽  
...  
Keyword(s):  
Thin Films ◽  
Corrosion Resistance ◽  
Sputter Deposition ◽  
Reactive Magnetron ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter

Structure and Mechanical Properties of Titanium Nitride, Zirconium Nitride, and Chromium Nitride Films by Reactive Magnetron-Sputter Deposition

1996 ◽  
Vol 458 ◽  
Author(s):  
W.-H. Soe ◽  
T. Kitagaki ◽  
H. Ueda ◽  
N. Shima ◽  
M. Otsuka ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Sputter Deposition ◽  
Zirconium Nitride ◽  
Chromium Nitride ◽  
Reactive Magnetron ◽  
Nano Indentation ◽  
Low Load ◽  
Magnetron Sputter Deposition ◽  
Magnetron Sputter ◽  
Hardness Values

ABSTRACTTiN, ZrN, and CrN films were grown by reactive magnetron sputtering on WC-Co sintered hard alloy substrates. Hardness and elastic modulus were measured by nano-indentation tester with low load on tip at 200 mgf. Hardness values were shown the higher value the thinner film thickness due to stress in the films.

scholarly journals Reactive Magnetron Sputter Deposition of Superconducting Niobium Titanium Nitride Thin Films With Different Target Sizes

2017 ◽  
Vol 27 (4) ◽  
pp. 1-5 ◽  
Author(s):  
Boy Gustaaf Cornelis Bos ◽  
David Johannes Thoen ◽  
E. A. F. Haalebos ◽  
P. M. L. Gimbel ◽  
T. M. Klapwijk ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Sputter Deposition ◽  
Reactive Magnetron ◽  
Magnetron Sputter Deposition ◽  
Niobium Titanium ◽  
Magnetron Sputter
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