Diagnostics of dual source reactive magnetron sputter deposition of aluminum nitride and zirconium nitride thin films

1992 ◽  
Vol 10 (4) ◽  
pp. 1804-1808 ◽  
Author(s):  
Jeffrey A. Sell ◽  
W. J. Meng ◽  
Thomas A. Perry
Vacuum ◽  
1995 ◽  
Vol 46 (12) ◽  
pp. 1385-1390 ◽  
Author(s):  
MF Cerqueira ◽  
M Andritschky ◽  
L Rebouta ◽  
JA Ferreira ◽  
MF da Silva

2020 ◽  
Vol 693 ◽  
pp. 137685 ◽  
Author(s):  
Kristina von Fieandt ◽  
Eirini-Maria Paschalidou ◽  
Aishwarya Srinath ◽  
Pavel Soucek ◽  
Lars Riekehr ◽  
...  

1996 ◽  
Vol 458 ◽  
Author(s):  
W.-H. Soe ◽  
T. Kitagaki ◽  
H. Ueda ◽  
N. Shima ◽  
M. Otsuka ◽  
...  

ABSTRACTTiN, ZrN, and CrN films were grown by reactive magnetron sputtering on WC-Co sintered hard alloy substrates. Hardness and elastic modulus were measured by nano-indentation tester with low load on tip at 200 mgf. Hardness values were shown the higher value the thinner film thickness due to stress in the films.


2017 ◽  
Vol 27 (4) ◽  
pp. 1-5 ◽  
Author(s):  
Boy Gustaaf Cornelis Bos ◽  
David Johannes Thoen ◽  
E. A. F. Haalebos ◽  
P. M. L. Gimbel ◽  
T. M. Klapwijk ◽  
...  

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