Microstructure and Electrical Properties of Tantalum Oxide Thin Film Prepared by Electron Cyclotron Resonance Plasma-Enhanced Chemical Vapor Deposition

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Oxide Thin Film ◽

Effects of annealing in O2 and N2 on the electrical properties of tantalum oxide thin films prepared by electron cyclotron resonance plasma enhanced chemical vapor deposition

Journal of Electronic Materials ◽

10.1007/bf02655461 ◽

1995 ◽

Vol 24 (10) ◽

pp. 1435-1441 ◽

Cited By ~ 33

Author(s):

IL Kim ◽

Jong-Seok Kim ◽

Oh-Seung Kwon ◽

Sung-Tae Ahn ◽

John S. Chun ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Tantalum Oxide ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Characterization of ZnO thin film deposited by electron cyclotron resonance plasma-assisted chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.021 ◽

2006 ◽

Vol 506-507 ◽

pp. 184-187 ◽

Cited By ~ 10

Author(s):

Isao Sakaguchi ◽

Haruki Ryoken ◽

Shunichi Hishita ◽

Hajime Haneda

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Zno Thin Film ◽

Electrical properties of silicon nitride films grown on a SiGe layer by distributed electron cyclotron resonance plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)09264-4 ◽

1997 ◽

Vol 294 (1-2) ◽

pp. 214-216 ◽

Cited By ~ 1

Author(s):

E Dufour-Gergam ◽

F Meyer ◽

F Delmotte ◽

M.C Hugon ◽

B Agius ◽

...

Keyword(s):

Silicon Nitride ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Sige Layer ◽

Silicon Nitride Films ◽

Electrical Properties of (Ba, Sr)TiO3Films on Ru Bottom Electrodes Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition at Extremely Low Temperature and Rapid Thermal Annealing

Japanese Journal of Applied Physics ◽

10.1143/jjap.38.2200 ◽

1999 ◽

Vol 38 (Part 1, No. 4B) ◽

pp. 2200-2204 ◽

Cited By ~ 6

Author(s):

Shuji Sone ◽

Reiko Akahane ◽

Koji Arita ◽

Hisato Yabuta ◽

Shintaro Yamamichi ◽

...

Keyword(s):

Electrical Properties ◽

Low Temperature ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Effect of rapid thermal annealing treatment on electrical properties and microstructure of tantalum oxide thin film deposited by plasma‐enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.359180 ◽

1995 ◽

Vol 77 (11) ◽

pp. 5978-5981 ◽

Cited By ~ 35

Author(s):

Seok Ryong Jeon ◽

Sung Wook Han ◽

Jong Wan Park

Keyword(s):

Thin Film ◽

Electrical Properties ◽

Vapor Deposition ◽

Tantalum Oxide ◽

Annealing Treatment ◽

Chemical Vapor ◽

Oxide Thin Film ◽

Thermal Annealing Treatment ◽

Rapid Thermal Annealing Treatment

Electrical properties of PZT thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

Materials Chemistry and Physics ◽

10.1016/0254-0584(96)80094-0 ◽

1996 ◽

Vol 45 (2) ◽

pp. 155-158 ◽

Cited By ~ 6

Author(s):

S.T. Kim ◽

J.W. Kim ◽

S.W. Jung ◽

J.S. Shin ◽

S.T. Ahn ◽

...

Keyword(s):

Thin Films ◽

Electrical Properties ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Pzt Thin Films ◽

Applications of dielectric thin film by electron cyclotron resonance plasma chemical vapor deposition for semiconductor photoelectronic devices

10.1117/12.319623 ◽

1998 ◽

Author(s):

Dongsheng Mao ◽

Manqing Tan ◽

Lianhui Chen

Keyword(s):

Thin Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Plasma Chemical ◽

Dielectric Thin Film ◽

Plasma Chemical Vapor Deposition ◽

Effect of nitrogen flow on the properties of carbon nitride films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Vacuum ◽

10.1016/j.vacuum.2021.110223 ◽

2021 ◽

pp. 110223

Author(s):

Sixu Lin ◽

Dong Xie ◽

Yongliang Tang ◽

Yiwen Wang ◽

Fengjuan Jing ◽

...

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Carbon Nitride ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Nitrogen Flow ◽

Electron Cyclotron Resonance Plasma ◽

c-Axis oriented AlN films prepared on diamond film substrate by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Journal of Crystal Growth ◽

10.1016/s0022-0248(01)01810-3 ◽

2002 ◽

Vol 235 (1-4) ◽

pp. 333-339 ◽

Cited By ~ 7

Author(s):

H Gong ◽

X Jiang

Keyword(s):

Diamond Film ◽

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

Film Substrate ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

In situ investigation of the passivation of Si and Ge by electron cyclotron resonance plasma enhanced chemical vapor deposition of SiO2

10.1116/1.589211 ◽

1996 ◽

Vol 14 (3) ◽

pp. 1687 ◽

Cited By ~ 9

Author(s):

Y. Wang

Keyword(s):

Vapor Deposition ◽

Cyclotron Resonance ◽

Chemical Vapor ◽

Electron Cyclotron ◽

Electron Cyclotron Resonance Plasma ◽

In Situ Investigation ◽