On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping

2014 ◽  
Vol 116 (4) ◽  
pp. 1905-1913 ◽  
Author(s):  
Ramanathaswamy Pandian ◽  
Gomathi Natarajan ◽  
S. Rajagopalan ◽  
M. Kamruddin ◽  
A. K. Tyagi
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Titanium Oxide ◽  
Phase Formation ◽  
Nitrogen Doping ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films

Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

Vacuum ◽  
2009 ◽  
Vol 83 ◽  
pp. S91-S94 ◽  
Author(s):  
Jurgita Čyvienė ◽  
Edvinas Navickas ◽  
Darius Milčius ◽  
Giedrius Laukaitis
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

The Influence of Total and Oxygen Partial Pressures on Structure and Hydrophilic Property of TiO2 Thin Films Deposited by Reactive DC Magnetron Sputtering

2008 ◽  
Vol 55-57 ◽  
pp. 465-468 ◽  
Author(s):  
Surasing Chaiyakun ◽  
A. Buranawong ◽  
T. Deelert ◽  
N. Witit-Anun
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Total Pressure ◽  
Dc Magnetron Sputtering ◽  
Tio2 Thin Films ◽  
Rutile Structure ◽  
Hydrophilic Property ◽  
Partial Pressures

TiO2 thin films have been deposited by reactive DC magnetron sputtering technique to study the effect of total pressure and oxygen partial pressure on structure and hydrophilic properties. The crystal structure and hydrophilic property was measured by XRD and contact angle meter, respectively. The results showed that the films were composed of pure rutile and mixed of anatase/rutile structure dependent on the total pressure and oxygen partial pressure. It was found that all films can perform hydrophilic property. In case of high total pressure, the films showed superhydrophilic property, whereas the films deposited under various oxygen partial pressures with fixed total pressure were all films exhibit superhydrophilic property.

Properties of Vanadium Oxide Films Prepared by DC Reactive Magnetron Sputtering at Different Oxygen Partial Pressures

2012 ◽  
Vol 538-541 ◽  
pp. 105-109 ◽  
Author(s):  
Ren Gui Huang ◽  
Dong Ping Zhang ◽  
Ting Zhang ◽  
Yan Li ◽  
You Tong Chen ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Oxygen Partial Pressure ◽  
Partial Pressure ◽  
Vanadium Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Dc Reactive Magnetron Sputtering ◽  
Vanadium Oxide Thin Films

Due to their unique physical and chemical properties, vanadium oxide thin films have become a hot research topic. In the present work, Vanadium oxide thin films were prepared by DC reactive magnetron sputtering at different oxygen partial pressure and thermally annealed in Ar atmosphere at 500°C for 2 hours. The microstructure, transmittance, optical band gap, resistivity, and temperature coefficient resistance (TCR) were measured. The results suggest that increasing of oxygen partial pressure can obviously improve the optical and electric properties

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