Physical Properties of Titanium Oxide Thin Films Prepared by DC Magnetron Sputtering: Influence Substrate Temperature and O2/Ar in the Gas Mixture

2013 ◽  
Vol 32 (6) ◽  
pp. 622-626 ◽  
Author(s):  
M. R. Hantehzadeh ◽  
M. Amou Amouha ◽  
S. Solaymani ◽  
T. Osati ◽  
B. Ghobadi
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Physical Properties ◽  
Titanium Oxide ◽  
Gas Mixture ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films

Titanium oxide thin films synthesis by pulsed – DC magnetron sputtering

Vacuum ◽  
2009 ◽  
Vol 83 ◽  
pp. S91-S94 ◽  
Author(s):  
Jurgita Čyvienė ◽  
Edvinas Navickas ◽  
Darius Milčius ◽  
Giedrius Laukaitis
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Titanium Oxide ◽  
Dc Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering
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