Band gap states of V and Cr in 6H-silicon carbide

1997 ◽  
Vol 65 (3) ◽  
pp. 329-331 ◽  
Author(s):  
N. Achtziger ◽  
J. Grillenberger ◽  
W. Witthuhn
Keyword(s):  
Band Gap ◽  
2003 ◽  
Vol 93 (4) ◽  
pp. 2289-2291 ◽  
Author(s):  
G. Pasold ◽  
F. Albrecht ◽  
J. Grillenberger ◽  
U. Grossner ◽  
C. Hülsen ◽  
...  
Keyword(s):  
Band Gap ◽  

1997 ◽  
Vol 71 (1) ◽  
pp. 110-112 ◽  
Author(s):  
Norbert Achtziger ◽  
Wolfgang Witthuhn
Keyword(s):  
Band Gap ◽  

2000 ◽  
Vol 62 (19) ◽  
pp. 12888-12895 ◽  
Author(s):  
N. Achtziger ◽  
G. Pasold ◽  
R. Sielemann ◽  
C. Hülsen ◽  
J. Grillenberger ◽  
...  
Keyword(s):  
Band Gap ◽  

2006 ◽  
Vol 527-529 ◽  
pp. 659-662
Author(s):  
G. Pasold ◽  
F. Albrecht ◽  
C. Hülsen ◽  
R. Sielemann ◽  
W. Witthuhn

Silicon carbide (SiC) was investigated for deep band gap states of europium by means of deep level transient spectroscopy (DLTS). The knowledge of the properties of optoelectrically active impurities or defects is essential for a detailed understanding of the energy-transfer process resulting in the observable excitations [1]. SiC-samples of the polytypes 4H as well as 6H are ion-implanted by different europium- isotopes in order to obtain a chemical identification of the characterized energy levels. Here the concentration sensitivity of the DLTS is applied to observe the elemental transmutation of the incorporated radioactive tracer atoms 146Eu (t1/2=4.51 d) and 147Eu (t1/2=24.6 d). DLTS on samples implanted with stable Eu-ions (153Eu) was carried out for comparison and manifestation of the results. From these studies 5 Eu-related deep band gap levels are established: in 4H-SiC two levels at EV+0.86(2) eV and EC−0.47(2) eV, and in 6H-SiC three levels at EV+0.88(2) eV, EC−0.29(2) eV and EC−0.67(2) eV.


2011 ◽  
Vol 679-680 ◽  
pp. 726-729 ◽  
Author(s):  
David T. Clark ◽  
Ewan P. Ramsay ◽  
A.E. Murphy ◽  
Dave A. Smith ◽  
Robin. F. Thompson ◽  
...  

The wide band-gap of Silicon Carbide (SiC) makes it a material suitable for high temperature integrated circuits [1], potentially operating up to and beyond 450°C. This paper describes the development of a 15V SiC CMOS technology developed to operate at high temperatures, n and p-channel transistor and preliminary circuit performance over temperature achieved in this technology.


2014 ◽  
Vol 16 (44) ◽  
pp. 24437-24442 ◽  
Author(s):  
Anja Bonatto Minella ◽  
Darius Pohl ◽  
Christine Täschner ◽  
Rolf Erni ◽  
Raghu Ummethala ◽  
...  

1981 ◽  
Vol 38 (11) ◽  
pp. 884-886 ◽  
Author(s):  
J. Singh ◽  
A. Madhukar
Keyword(s):  
Band Gap ◽  

Sign in / Sign up

Export Citation Format

Share Document