Pulsed-laser deposition of Ta-doped PZT ferroelectric films for memory applications using conductive oxide La 0.25 Sr 0.75 CoO 3 and SrRuO 3 electrodes

1999 ◽  
Vol 69 (7) ◽  
pp. S659-S661 ◽  
Author(s):  
Z.G. Liu ◽  
J. Yin ◽  
Z.C. Wu
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Ferroelectric Films ◽  
Conductive Oxide ◽  
Memory Applications

Pulsed laser deposition of relaxor ferroelectric films

1998 ◽  
Vol 08 (PR9) ◽  
pp. Pr9-261-Pr9-264
Author(s):  
M. Tyunina ◽  
J. Levoska ◽  
A. Sternberg ◽  
V. Zauls ◽  
M. Kundzinsh ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Relaxor Ferroelectric ◽  
Laser Deposition ◽  
Ferroelectric Films

Characteristics of SrBi2Ta2O9 thin films prepared by pulsed laser deposition for non-volatile memory applications

2000 ◽  
Vol 375 (1-2) ◽  
pp. 200-204 ◽  
Author(s):  
Xinhua Zhu ◽  
Yiming Liu ◽  
Zhenghua An ◽  
Tao Zhu ◽  
Zhuangchun Wu ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Non Volatile Memory ◽  
Volatile Memory ◽  
Memory Applications

Pulsed laser deposition of transparent conductive oxide thin films on flexible substrates

2012 ◽  
Vol 260 ◽  
pp. 42-46 ◽  
Author(s):  
G. Socol ◽  
M. Socol ◽  
N. Stefan ◽  
E. Axente ◽  
G. Popescu-Pelin ◽  
...  
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Transparent Conductive Oxide ◽  
Laser Deposition ◽  
Flexible Substrates ◽  
Oxide Thin Films ◽  
Conductive Oxide

Pulsed Laser Deposition of SrBi2Ta2O9 Thin Films for Nonvolatile Memory Applications

1995 ◽  
Vol 397 ◽  
Author(s):  
S. Werner ◽  
D. Thomas ◽  
S.K. Streiffer ◽  
O. Auciello ◽  
Angus I. Kingon
Keyword(s):  
Thin Films ◽  
Pulsed Laser Deposition ◽  
Nonvolatile Memory ◽  
Elevated Temperatures ◽  
Sol Gel ◽  
Pulsed Laser ◽  
Hysteresis Loops ◽  
Laser Deposition ◽  
Polarization Electric Field ◽  
Memory Applications

ABSTRACTFerroelectric SrBi2Ta2U9 (SBT) thin films were synthesized by pulsed laser deposition (PLD) on platinized silicon substrates held at different substrate temperatures, from targets with different compositions. It was necessary to anneal films deposited at low temperature (525°C) at elevated temperatures in an oxygen atmosphere in order to achieve properties comparable to SBT thin films grown by the sol-gel technique. Polarization – electric field hysteresis loops showed saturation in the 2-5 V range with a remnant polarization 2Pr = 8-13 µC/cm2. Capacitors showed negligible fatigue up to 1010 switching cycles.

Heteroepitaxial growth of Nb-doped SrTiO3 films on Si substrates by pulsed laser deposition for resistance memory applications

2007 ◽  
Vol 90 (5) ◽  
pp. 052110 ◽  
Author(s):  
Wenfeng Xiang ◽  
Rui Dong ◽  
Dongsoo Lee ◽  
Seokjoon Oh ◽  
Dongjun Seong ◽  
...  
Keyword(s):  
Pulsed Laser Deposition ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Heteroepitaxial Growth ◽  
Si Substrates ◽  
Memory Applications
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