Investigation of the substrate effect for Zr doped ZnO thin film deposition by thermionic vacuum arc technique

This review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition.

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ZnS thin film deposition on Silicon and glass substrates by Thermionic vacuum Arc

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2011.07.004 ◽

2012 ◽

Vol 15 (2) ◽

pp. 113-119 ◽

Cited By ~ 17

Author(s):

M. Özkan ◽

N. Ekem ◽

S. Pat ◽

M.Z. Balbağ

Keyword(s):

Thin Film ◽

Thin Film Deposition ◽

Film Deposition ◽

Vacuum Arc ◽

Glass Substrates ◽

Thermionic Vacuum Arc

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Silver Doped Zinc Oxide Thin Film Production by Thermionic Vacuum Arc (TVA) Technique

Journal of the chemical society of pakistan ◽

10.52568/000581 ◽

2021 ◽

Vol 43 (3) ◽

pp. 253-253

Author(s):

Mehmet zkan Mehmet zkan ◽

Sercen Sadik Erdem Sercen Sadik Erdem

Keyword(s):

Thin Film ◽

Thin Films ◽

Zinc Oxide ◽

Band Gap ◽

Glass Substrate ◽

Zno Thin Films ◽

Vacuum Arc ◽

Zno Thin Film ◽

Doped Zno ◽

Thermionic Vacuum Arc

In this paper, silver (Ag)doped Zinc Oxide(ZnO) thin films were prepared on glass and silicon substrate by using a thermionic vacuum arc technique. The surface, structural, optical characteristics of silver doped thin films have been examined by X-Ray diffractometer (XRD), field emission scanning emission electron microscopy (FESEM), atomic force microscopy (AFM), and UV-Visible spectrophotometer. As a result of these measurements, Ag, Zn and ZnO reflection planes were determined for thin films formed on Si and glass substrate. Nano crystallites have emerged in FESEM and AFM images. The produced films have low transparency. The optical band gap values were measured by photoluminescence devices at room temperature for thin films produced on silicon and glass substrate. The band gap values are very close to 3.10 eV for Ag doped ZnO thin films. The band gap of un-doped ZnO thin film is approximately 3.3 eV. It was identified that Ag doped changes the properties of the ZnO thin film.

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