Argon pressure dependent optoelectronic characteristics of amorphous tin oxide thin films obtained by non-reactive RF sputtering process

2021 ◽  
Author(s):  
N. Ziani ◽  
A. C. Galca ◽  
M. S. Belkaid ◽  
I. Stavarache
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Rf Sputtering ◽  
Argon Pressure ◽  
Oxide Thin Films

scholarly journals Effects of gas flow rate on the structure and elemental composition of tin oxide thin films deposited by RF sputtering

AIP Advances ◽  
2017 ◽  
Vol 7 (12) ◽  
pp. 125105 ◽  
Author(s):  
Muntaser Al-Mansoori ◽  
Sahar Al-Shaibani ◽  
Ahlam Al-Jaeedi ◽  
Jisung Lee ◽  
Daniel Choi ◽  
...  
Keyword(s):  
Thin Films ◽  
Elemental Composition ◽  
Flow Rate ◽  
Tin Oxide ◽  
Gas Flow ◽  
Rf Sputtering ◽  
Gas Flow Rate ◽  
Oxide Thin Films

The Effect of Vacuum Annealing of Tin Oxide Thin Films Obtained by RF Sputtering

2011 ◽  
Vol 48 (4) ◽  
pp. 316-322 ◽  
Author(s):  
Sun-Phil Kim ◽  
Young-Rae Kim ◽  
Sung-Dong Kim ◽  
Sarah Eun-Kyung Kim
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Vacuum Annealing ◽  
Rf Sputtering ◽  
Oxide Thin Films

Plasma-assisted deposition of indium tin oxide thin films by sublimation using an anodic vacuum arc discharge

2021 ◽  
pp. 138731
Author(s):  
Bert Scheffel ◽  
Olaf Zywitzki ◽  
Thomas Preußner ◽  
Torsten Kopte
Keyword(s):  
Thin Films ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Arc Discharge ◽  
Vacuum Arc ◽  
Oxide Thin Films
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